KCTECH is the company, founded in February 1987 and specialized in semiconductor systems, materials and display systems.
KCTECH provides the CMP system and wafer cleaner for the semiconductor pre-process.
For the material product, the CMP slurry wafer abrasive is available.
KCTECH also provides the Display equipment, consists of Cleaner, Developer, Etcher, Stripper, and Coater for the display pre-process.
KCTECH established by spin-off in November 2017, set a goal of becoming the most reliable global technology partner with value creating through seamless innovation and dedicated R&D.
Semiconductor Equipment / Material
- CMP: Chemical Mechanical Polishing Semiconductor Equipment
- Wet Cleaning System: Cleaner that remove particles, metallic impurities and surface adhered chemicals
- Slurry: Semiconductor planarization polishing consumable materials used in the process
Display Equipment / Material
- Wet station: Wet chemical process equipment
(Cleaner, Developer, Etcher, Stripper)
- Coater: PR(Photo Resist) Coating equipment before Exposure process
- Materials : Display material used for optical characteristics control functions