Kookje Electric Korea Co., Ltd.

Chung Cheong Nam Do, 
Korea (South)
  • Booth: A518

Kook Je Electric Korea Co.,Ltd. gives greatest effort for research & development
with determination of becoming the foundation for semiconductor industry. 
In May of 1993, Kook Je Electric Korea Co.,Ltd. was cofounded with Japan’s 
KOKUSAI ELECTRICCORPORATION which is a global semiconductor
equipment maker. 
We continue to grow as a company and contribute to national development
through production and sales of semiconductor and LCD facilities,
and maintenance service and research & development.


  • AdvancedAce®
    Batch Thermal Process System...

  • ▉  Process Applications

    - Thin film deposition, Oxidation & Anneal

    ▉  Features

    - High productivity: 1.5 x current product
    - Good uniformity for deep trenches
    - High quality @ low temperatures
    - Remote diagnostics (*option)

    ▉  Overview
    AdvancedAce® is KOKUSAI ELECTRIC's newest high throughput
    batch thermal processingplatform which enables excellent process
    control and significant cycle time reduction withits core technologies
    such as precise temperature, vacuum, pressure and gas control,
    fast and reliable wafer handling automation.

    High Quality & High Performance Thermal Process System...

  •   Process Applications

    - Thin film deposition


    - New innovative reactor design
    - Provides thickness uniformity improvement with least loading effect
    - Shorten total cycle time with dramatically improved reaction gas 

    - Low particle & High speed wafer transfer automation
    - High productivity, Small footprint

    ▉  Overview

    TSURUGI-C²® ® is KOKUSAI ELECTRIC's new thermal
    processing platformwhich is most recently developed for advanced
    devices especially for
    the ones with high aspect ratio 3D structures
    requiring high quality,
    uniform and conformal film deposition with
    new innovative reactor design
    and process techniques.

    Single Wafer Plasma Nitridation / Oxidation System...

  •    Process Applications

    - Plasma nitridation / oxidation
    - Treatment processes

    ▉  Features

    - Excellent for isotropic deep trenches
    - Low damage plasma process
    - High temperature heater for high quality film
    - New high productivity platform

    Single Wafer Annealing System...

  •   Process Applications

    - Low temperature anneal
    - Cure processes

    ▉  Features

    - High throughput by high speed wafer transfer automation
    - Optimal heater for baking excellent uniformity & stability
    - Low contamination
    - Small footprint, Excellent availability
    - Extensive delivery record

    ▉  Overview

    TΛNDUO® is able to provide optimum system for cure, annealing,
    degas etc. by module selection according to process.
    Moreover, we offer excellent productivity and very low particle
    process environment by combining with our own high-speed
    transfer system.

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