Merck Performance Materials Ltd.

Seoul, 
Korea (South)
http://www.merck.co.kr
  • Booth: D620


Merck supports innovation of global electronics industry.

Merck is a leading science and technology company in healthcare, life science and performance materials. Around 53,000 employees work to further develop technologies that improve and enhance life – from biopharmaceutical therapies to treat cancer or multiple sclerosis, cutting-edge systems for scientific research and production, to liquid crystals for smartphones and LCD televisions.Founded in 1668, Merck is the world's oldest pharmaceutical and chemical company. The founding family remains the majority owner of the publicly listed corporate group. Merck holds the global rights to the Merck name and brand. The only exceptions are the United States and Canada, where the company operates as EMD Serono, MilliporeSigma and EMD Performance Materials.


 Products

  • Photoresists
    Photoresists are light-sensitive materials used in several industrial processes, such as photolithography and photoengraving to form a patterned coating on a surface....

  • Photoresists are either positive tone or negative tone and most pervasively used in the manufacture of integrated circuits and flat panel displays. Materials for the integrated circuit industry can be used for a wide variety of lithographic processes covering a wide range of exposure tools and processes. Applications range from sub-micron geometries to thick film applications. All materials are spin coated and can be matched to a large variety of substrates.

  • Spin-on Dielectrics
    Spin-on Dielectrics or AZ® Spinfil® SOD Series is a Poly (perhydrosilazane) - (SiH2NH) based inorganic SOD material to be used for gapfilling and in planarization applications in advanced device manufacturing....

  • AZ® Spinfil® SOD Series can be converted to SiO2 based film which has similar properties to high performance CVD. AZ® Spinfil® SOD Series is the industry-standard material and is used as the dielectric technology for FEOL gapfilling applications in advanced device manufacturing.

  • Chemical Shrink Formulations
    Chemical shrink coatings (RELACs) are water based polymer products that are used to shrink openings defined by the photoresist pattern....

  • This product enables defined features to be shrunk by up to 60nm with existing lithography equipment. Therefore, with this product, 248nm or 193-dry technology can be extended to substantially lower feature sizes without investing in new scanner technology

  • Anti-collapse Rinses
    Anti-collapse rinse products provide wider process window capabilities for EUV(13nm) photoresists....

  • By applying the anti-collapse rinse after the photoresist development and DI water rinse steps, the pattern collapse behavior is significantly improved. Thus the photoresist film thickness can be increased to a level suitable for the substrate etch process while maintaining a manufacturable process window.
  • Klebosol Colloidal Silica
    Klebosol is a leading brand of multipurpose colloidal silica, with applications in a diverse array of industries ranging from beverage to electronics....

  • The Klebosol range of colloidal silica products are stable suspensions of independent (non-agglomerated), non-porous and spherical particles of silica (SiO2).

  • Precursor for Deposition Process
    Thin Film Technology used in the manufacture of integrated circuits including Wafer, Resistor, condenser and Insulator....

  • According to advanced wafer density, film thickness is changed to more thinner and wilder and it needs thin film having more thermally safer and uniformity. That is CVD(Chemical Vapor Deposition)/ALD(Atomic layer Deposition) using precursor composed in organic metal compound 

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