NCK is factory in Pyeongtaek. We manufacture BARC and PI.
BARC is a bottom anti-reflective coating developed for semiconductor lithography. It solves various problems with exposure by coating under photoresist products. They are effective in preventing problems caused by reflection of light from substrate. NCK Co., Ltd. is in conjunction with Nissan Chemical Ind., Ltd. has developed Immersion ArF ARC(R), Spin-on Hard Mask (Si-containing hard mask, Carbon under layer) for multi-layer process etc. for next generation lithography process to satisfy all customer's requirements. As your reference, "(R)" on ARC (R) means "registered mark" by Brewer Science.