Park Systems Corp.

Korea (South)
  • Booth: D239

Enabling Nanoscale Advances

Playing a critical role in the development of AFM technology, Park Systems has remained the leading innovator in nanoscale microscopy and metrology throughout its long history and continues to invest in the development of new emerging technologies. With headquarters in Korea, the US, Japan, Europe, China and Singapore, we create some of the world’s most accurate and most effective AFMs for research and industry. Our team is constantly striving to continue meeting the needs of scientists and engineers worldwide. As the global microscopy market grows rapidly, we will continue to innovate and develop new systems and features that make our products the most effective and most efficient nanoscale microscopy there is. Products from Park Systems are used by some of the most notable researchers and corporations across the globe. We strive to meet the needs of our clients by constantly working to create the most accurate, easy to use nanoscale microscopy technology available.


  • NX10
    At Park Systems, we understand that in today’s highly competitive world, researchers can’t afford to worry about the precision of their instruments. That’s why we developed the Park NX10, the world’s most accurate and easy-to-use AFM....

  • Innovative features for innovative work

    Accurate XY Scan by Crosstalk Elimination

    • Two independent, closed-loop XY and Z flexure scanners for sample and probe tip
    • Flat and orthogonal XY scan with low residual bow
    • Out-of-plane motion of less than 1 nm over an entire scan range
    • Z scanner linearity deviation of less than 0.015% over an entire scan range
    • Accurate height measurements without any need for software processing

    Accurate AFM Topography with Low Noise Z Detector

    • Sample topography measured by industry leading low noise Z detector
    • True Sample Topography™ without edge overshoot or piezo creep error
    • Accurate surface height recording, even during high-speed scanning
    • Reduced XY scanner ringing by forward sine-scan algorithm
    • Industry leading forward and backward scan gap of less than 0.15%

    Best Tip Life, Resolution and Sample Preservation by True Non-Contact™ Mode

    • Industry leading Z-scanner bandwidth of more than 9 kHz
    • Fastest Z-servo speed of more than 62 mm/sec tip velocity
    • Minimum tip wear for prolonged high-quality and high-resolution imaging
    • Minimized sample damage or modification
    • Immune from parameter-dependent results common in tapping imaging

    User Experience-Driven Software and Hardware Features

    • Open side access for easy sample or tip exchange
    • Easy, intuitive laser alignment with pre-aligned tip mount
    • Easy head removal by dovetail-lock mount
    • Direct on-axis optics for high resolution optical viewing
    • Fast automatic tip approach to sample surface within 10 seconds
    • Park SmartScanTM - AFM operating software versatile enough to empower both novices and power users alike toward great nanoscale research.
    • Auto mode: Automated image acquisition in three easy steps to determine probe setup, scan position, and scan area.
    • Manual mode: Opens various up scan parameters and macro/scripting support to advanced users for fine-tuned scan control.

    The Most Comprehensive and Extensible AFM Solution

    • The most extensive range of SPM modes
    • The largest number of sample measurement options
    • The best option compatibility and upgradeability in the industry
    • 24 bit digital electronics with three internal lock-ins, Q-control, and spring constant calibration
    • Active temperature control of acoustic enclosure
  • NX-Wafer
    NX-Wafer is the only wafer fabrication AFM with automatic defect review. This gives it the power to increase the throughput of your lab by up to 1000% while ensuring a high level of accuracy and quality control when scanning wafers up to 300 mm in size....

  • The only wafer fab AFM with automatic defect review

    Fully automated AFM solution for defect imaging and analysis that improves defect review productivity by up to 1,000%

    Park's Smart ADR provides fully automated defect review and identification, enabling a critical inline process to classify defect types and source their origin through high resolution 3D imaging.

    Designed specifically for the semiconductor industry, Smart ADR is the most advanced defect review solution available, featuring automatic target positioning without the need for labor intensive reference marks that often damage the sample. The Smart ADR process improves productivity by up to 1,000% compared to traditional defect review methods. Additionally, the new ADR capability offers up to 20x longer tip life thanks to Park's groundbreaking True Non-Contact™ Mode AFM technology.

    Low noise Atomic Force Profiler for accurate, high throughput CMP profile measurements

    The industry leading low noise Park AFM is combined with a long range sliding stage to become an Atomic Force Profiler (AFP) for chemical mechanical polishing (CMP) metrology. The new low noise AFP provides very flat profiling for both local and global uniformity measurements with the best profiling accuracy and repeatability on the market. Unique True Non-Contact™ mode enables nondestructive in-line measurements with much longer tip life, while Park's innovative True Sample Topography™ obtains CMP profiles without the usual artifacts associated with a traditional piezotube-based AFP. This guarantees accurate height measurements with no non-linear or high noise background subtraction over a wide range of profiling lengths.

    Sub-Angstrom surface roughness measured with extreme accuracy and minimized tip-to-tip variation

    The surface roughness of a wafer is critical in determining the performance of a semiconductor device. For the state-of-the-art device manufacturer, both chip makers and wafer suppliers are demanding more accurate roughness control of ultra-flat surface on Si or SOI wafers. By delivering the industry’s lowest noise floor of less than 0.5 Å and combining it with True Non-Contact™ mode, Park NX-Wafer can reliably acquire sub-Angstrom roughness measurements with minimum tip-to-tip variation. Park's Crosstalk Elimination also allows very flat orthogonal XY scanning with no background curvature, even on the flattest of surfaces regardless of scan location, rate, and size. This enables very accurate and repeatable surface measurement from micro-roughness to long-range waviness.

BEWARE - Special Warning Notice about ExpoGuide and FAIRGuide

With the ongoing solicitations, SEMI would like to continue to alert you with questionable professional practices perpetrated against exhibitors by (Austria) and Expo Guide (Mexico), Event Fair - The Exhibitors' Guide with their misleading directory services. There may be others that we are not aware of and are hence not named here. 

These companies provide legitimate exhibition guides aimed at exhibitors across the globe offering online listing services. They use a form which resembles and organizer's free catalogue listing service, inviting exhibitors to complete the form for an entry in an on-line directory. Unsuspecting exhibitors who sign and return the form are then contracted into a three-year, non-retractable agreement, which could cost the exhibitor a significant amount of money, with very limited foreseeable benefits. The details are often available on the form itself, but are often too small and insignificant to be noticed. It is always wise to really the small print before signing a contract, and if the information is impossible to read then the contract should not be signed. These publications have no connection with SEMI or any of our events, and it is important that all companies are made aware of this. 

Should you receive any communication from the Expo-Guide and or related company, please IGNORE THEM COMPLETELY and DO NOT COMMUNICATE WITH THEM IN ANY WAY.

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