Purion™ - Tools for Achieving the Performance Edge
The Purion platform redefines the ion implanter application space, delivering unmatched purity, precision and productivity to enhance customers’ device performance and yield. The systems’ common cross-product platform architecture is designed to drive manufacturing flexibility and lower the total cost of fab operations. All Purion implanters incorporate Axcelis’ industry leading Purion Contamination Shield™ Defense System, for unsurpassed implant quality, so even the most sensitive devices can realize optimized device performance. The platform’s proprietary Purion Vector™ dose and angle control system, and constant focal length scanning deliver the most precise and repeatable dopant placement available today. The platform’s superior beam current performance combined with the Purion™ 500wph end station provides the industry’s highest productivity. The Purion platform includes the Purion M™ medium current implanter, the Purion H™ high current implanter, and the Purion XE™ and Purion VXE™ high energy implanters.