Axcelis Technologies

Beverly,  MA 
United States
http://www.axcelis.com
  • Booth: D704


Purion™ - Enabling Digital Transformation for the 5G Era

The Purion platform redefines the ion implanter application space, delivering unmatched purity, precision and productivity to enhance customers’ device performance and yield.   The systems’ common cross-product platform architecture is designed to drive manufacturing flexibility and lower the total cost of fab operations. All Purion implanters incorporate Axcelis’ industry leading Purion Contamination Shield™ Defense System, for unsurpassed implant quality, so even the most sensitive devices can realize optimized device performance.  The platform’s proprietary Purion Vector™ dose and angle control system, and constant focal length scanning deliver the most precise and repeatable dopant placement available today.   The platform’s superior beam current performance combined with the Purion™ 500wph end station provides the industry’s highest productivity. The Purion platform includes the Purion M™ medium current implanter, the Purion H™ high current implanter, and the Purion XE™ and Purion EXE and Purion VXE high energy implanters.


 Press Releases

  • BEVERLY, Mass., July 9, 2018 -- Axcelis Technologies, Inc. (Nasdaq: ACLS), a leading supplier of innovative, high-productivity solutions for the semiconductor industry, announced today that it has released a new Purion Power Series™ product family to meet the growing market demand for the power device market.  This new product family, which includes the Purion M Power Series™ for medium current, the Purion H Power Series™ for high current and the Purion XE Power Series™ for high energy, was developed with enabling technology to specifically address the unique needs of emerging power device applications.

    Bill Bintz, executive vice president, product development, commented, “We’re excited to offer a comprehensive solution to our power device manufacturing customers. The Purion Power Series family is uniquely suited to excel at these applications due to its innovative platform that offers the flexibility to handle multiple wafer sizes from 150mm to 300mm as well as various substrates including Si and SiC, along with its precision wafer temperature control technology, all accomplished while delivering the industry’s highest throughput and capital efficiency.”

    John Aldeborgh, executive vice president, customer operations, commented, “Power devices are one of the fastest growing segments in IC manufacturing, due to the robust e-mobility and renewable energy markets.  Customer inquiries and demand for Purion products serving this very active market have increased, driving significant opportunity for the Purion Power Series family of products.”
     

    About Axcelis:

    Axcelis (Nasdaq: ACLS), headquartered in Beverly, Mass., has been providing innovative, high-productivity solutions for the semiconductor industry for 40 years. Axcelis is dedicated to developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the most critical and enabling steps in the IC manufacturing process. Learn more about Axcelis at www.axcelis.com.
     

    CONTACTS:

    Maureen Hart (editorial/media) 978.787.4266

    Doug Lawson (investor relations) 978.787.9552

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  • BEVERLY, MA., Nov. 28, 2018Axcelis Technologies, Inc. (Nasdaq: ACLS), a leading supplier of enabling ion implantation solutions for the semiconductor industry, confirms receiving a multiple system order for both high-current and high-energy ion implanters from a major analog customer in Japan with deliveries scheduled in the fourth quarter of 2018 and the first quarter of 2019.  Expanding their engagement in the Japan market, Axcelis also plans to showcase their Purion™ Platform of ion implanters in the SEMICON Japan 2018 exhibition.  The company will be participating in SEMICON Japan with its distribution and support partner, SCREEN Semiconductor Solutions Co., Ltd., booth #5445 in Hall 5. The SEMICON event, one of the most important technology forums in the Asia Pacific region, is being held December 12-14, at the Tokyo Big Sight in Tokyo, Japan. 

    Mary Puma, president and CEO of Axcelis Technologies, said, “We are excited to be working closely with SCREEN Semiconductor Solutions to offer new implant solutions to leading Japanese semiconductor companies. Our Purion H, high current implant demo capability at SCREEN’s Process Technology Center in Hikone, Japan will be operational in the first quarter 2019, and we are making strong advances through our technical collaboration.”  She continued, “It is rewarding to be a part of this important growing market, and to foster new opportunities to introduce the Purion platform’s advanced ion implant technology to Japanese chipmakers.” 

    Tadahiro Suhara, representative director and president of SCREEN Semiconductor Solutions, commented, “Japanese customers are very impressed by the advanced capabilities provided by Axcelis` ion implant technology. SCREEN is committed to working with our customers and providing comprehensive service and support for Purion product success in Japan.  With that objective in mind, we have invested in our Hikone Process Technology Center infrastructure to enable Purion tool demonstration and training capability within Japan.  SCREEN will include Purion ion implanters among our offerings in our exhibit booth at SEMICON Japan.”

    About Axcelis:
    Axcelis (Nasdaq: ACLS), headquartered in Beverly, Mass., has been providing innovative, high-productivity solutions for the semiconductor industry for over 35 years. Axcelis is dedicated to developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the most critical and enabling steps in the IC manufacturing process. Learn more about Axcelis at www.axcelis.com.

    AXCELIS CONTACTS:

    Maureen Hart (editorial/media) 978.787.4266

    Doug Lawson (investor relations) 978.787.9552

    ###


 Products

  • Purion H
    High Current Implanter...

  • Purion H ion implanters bring the industry-leading process control of our medium current platforms to the full range of demanding, high-current applications. The flexibility of the platform enables us to tailor Purion H to the specific energy or dosing requirements of your application. The Purion H offers unmatched versatility, throughput and uniformity, so you can achieve greater yield with the lowest cost of ownership.

  • Purion M
    Medium Current Implanter...

  • Our Purion M ion implanters offer the broadest spectrum of mid-current doses available, offering unparalleled flexibility to meet today’s evolving implant requirements. With high energy capability far beyond competitive implanters, the Purion M is ideal for fabs at higher elevations or those dealing with heavy air mass species. Yet it’s 20% more energy efficient than competing platforms, contributing the industry’s lowest cost of ownership.

  • Purion XE Series
    High Energy Implanter...

  • Our Purion XE series of ion implanters have rapidly earned a reputation as the industry standard for today’s demanding high energy recipes. Their unique RF Linear Accelerator (LINAC) technology offers higher reliability, a wider energy range and greater reliability than competing platforms, with superior metals contamination control.

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