• Booth: C644

 

SK Trichem was established in 2016. It is a semiconductor precursor jointed venture with SK materials, one of the Koreas top specialty gas maker, and Tri Chemical Laboratories InC which has the leading Precursor development technology in Japan.

Precursors are organometallic compounds that uniformly deposit various compounds on semiconductor circuits.
As semiconductors become highly integrated and miniaturized, stable and uniform thin film formation becomes important, and the amount of precursor used as a core material is rapidly increasing. Major items are Zr, Ti, Hf (for High-k) and Si precursors.
SK Trichem, based on the trust and customer responsiveness of the SK Materials and tehcnology of TCLC, We will continue to fulfill our role as a major growth leader in the future through the integration of precursor technology.
We promises that all of executives and staffers do our best to give customers satisfaction.


 Products

  • Precursor
    1. High-k precursor : Zr, Ti, Hf 2. Low-k precursor : BTBAS...

  • 1. Zr Precursor: It is used in capacitor manufacturing process of semiconductor DRAM and is used for ZrO2 thin film deposition through ALD process.
    2. Ti Precursor: It is used in capacitor manufacturing process of semiconductor DRAM and is used for TiO2 thin film deposition through ALD process
    3.Hf Precursor: It is used in capacitor manufacturing process of semiconductor DRAM and is used for HfO2 thin film deposition through ALD process.
    4. Si Precursor: It is used in capacitor manufacturing process of semiconductor DRAM and 3D-NAND is used for SiO2 thin film deposition through CVD/ALD process.

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