Hangzhou Cobetter Filtration

Chemrapid Filter series improve flow performance, cleanliness and contamination control at low wafer defect levels for highly corrosive acids and bases. The modified PTFE membrane enables semiconductor makers to meet their critical chemical filtration requirements.

Chemrapid Filter Series are suitable for filtration of H2SO4, H3PO4, HNO3, HCI, NH4OH, H2O2, TMAH and deionized water at room temperature and SC1, SC2, SPM, metal etching and other applications at high temperatures. Excellent chemical compatibilty and ultra-low metal extractables ensure superior filtration effciency and extended service life. THe non-dewetting PTFE membrane increases the surface energy providing high flow rates and superior filtration efficiency.
Ultra-pure cleanliness reduces equipment sep up time. Its one-piece structural design makes it easy to install and replace.
Available in T, L and In-line configurations which simplify system design.

- Application
  1) Single Wafer and Batch Processing in advanced technology node
  2) Wet Etch and Clean
  3) Chemicals

- Features
  1) Excellent Chemical Compatibility
  2) All fluorine construction makes it suitable for the filtration of highly corrosive high temperature chemicals
  3) Suitable for critical condition
  4) 100% integrity tested
  5) High flow rates, low pressure  , long service life
  6) Low extractables
  7) Provided prewet option, reducing equipment pre-operation time.

The asymmetric PES membrane provides significant retention of particles(down to 1nm) with additional characteristics including high flow rates, high dirt holding capacity, and longer filter lifetime. In addition, the membrane structure reduces bubbles formation during flow. These filters have high mechanical strength and are suitable for a wide variety of filtration processes.
Novacon Disposable Filters have an all fluorine construction. Its one-piece structural design makes it easy to install and replace and ensure cleanliness.

Application
 1) Process : Wet Etch and Cleans
 2) Installation Point : Point of Tool
 3) Low temperature precesses
 4) Chemistry : Dilute acids(such as BOE/DHF/SC2)
 5) Dilute bases (Such as SC1/TMAH); DIW

Features
 1) Reduce equipment pre-operation time
 2) Excellent retention
 3) Very high flow rates and longer life
 4) Ultralow metal ion extractables option
 5) Manufactured in a cleanroom environment
 6) 100% integrity tested

Using its superior cleaning method, the high purity PE structure ensures cleanliness, low particle shedding and eliminates contaminants, thereby improving removal efficiency. In addition, the filters large surface area provides high flow rates and extended service life.
Available in a wide variety of sizes and configurations to meet all your requirements. 

- Application
 1) Photoresist Filtration
 2) Solvent Filtration
 3) Photochemical Filtration
 4) Wet Clean

- Features
 1) Higher Efficiency
 2) Higher Chemical Compatibility
 3) Better Initial Cleanliness
 4) Ultra-low Metal and Organic Extractables