Hangzhou Cobetter Filtration Equipment Co., Ltd.

  • Booth: C335


Cobetter-Cooperation makes better future!

Cobetter는 2003년 설립된 Filter & Housing 전문제조업체로서 중국 항저우에 본사 및 공장이 위치하고 있습니다. 
저희는 지난 16년 동안 지속적인 연구 개발 노력으로 전세계 선두 Filter 업체에서 보유하고 있는 대부분의 제품을 개발/양산 중이며,
경쟁사 대비 품질 및 가격경쟁력을 능가하기 위하여 지속적인 노력을 하고 있습니다. 
또한 고객 needs를 좀 더 빠르게 받아들이고 꾸준한 개선활동을 통해 선두 업체로 발돋움하기 위하여 전세계 지사들을 설립하여 현지에서 고객대응하고 있습니다.  한국에서도 2019년 법인 설립 및 인원 보강하여  적극적인 파트너로써 고객의 품질향상  및 원가 절감에 기여할 수 있는 협력사로 발돋움 중입니다.  한국 코베터주식회사는  경기도 흥덕지구 IT Vally 컴플렉스동 306호에 위치하고 있으며 한국과 중국에서 동시에 support하여 보다 빠르고 적극적인 대응을 통해 고객만족도를 높일 수 있도록 노력하고 있습니다.  현재 폐사는 반도체 고품질 대체품 뿐만아니라  디스플레이 & Industry쪽의 국내외 중저가형 필터업체와의 가격경쟁력을 확보한 제품들을 보유하고 꾸준이 고객 확대를 해 나가고 있습니다. 
Chemical 공급장치, Utility, Gas Filter, PR Filter, PI Filter 및 IPA Purifier도  보유 중에 있고 Display의 PR Filter,액정필터, 세정기,식각기,박리기에 사용되는 226/334/HF/EX필터, PI Coater용 Cartridge, 일체형 filter등 다양한 제품을 보유하고 있습니다. 
공정엔지니어와 직접적인 미팅/협의을 통해 고객사에서 필요한 제품 개발까지 가능한 연구인력도 확보하고 있습니다 . 
저희 코베터는 품질 경쟁력과 원가 절감을 위한 적극적인 협력자로서 준비하고 있으니 많은 관심과 문의 부탁 드립니다.


 Products

  • Chemrapid Surface-modified Ultrapure Chemicals Fil
    Chemrapid Filter Series are composed of a surface-modified PTFE membrane that is bonded with PFA which results in ultra low metal extractables. It solves the problem of defect fluidity when if filters foam....


  • Chemrapid Filter series improve flow performance, cleanliness and contamination control at low wafer defect levels for highly corrosive acids and bases. The modified PTFE membrane enables semiconductor makers to meet their critical chemical filtration requirements.

    Chemrapid Filter Series are suitable for filtration of H2SO4, H3PO4, HNO3, HCI, NH4OH, H2O2, TMAH and deionized water at room temperature and SC1, SC2, SPM, metal etching and other applications at high temperatures. Excellent chemical compatibilty and ultra-low metal extractables ensure superior filtration effciency and extended service life. THe non-dewetting PTFE membrane increases the surface energy providing high flow rates and superior filtration efficiency.
    Ultra-pure cleanliness reduces equipment sep up time. Its one-piece structural design makes it easy to install and replace.
    Available in T, L and In-line configurations which simplify system design.

    - Application
      1) Single Wafer and Batch Processing in advanced technology node
      2) Wet Etch and Clean
      3) Chemicals


    - Features
      1) Excellent Chemical Compatibility
      2) All fluorine construction makes it suitable for the filtration of highly corrosive high temperature chemicals
      3) Suitable for critical condition
      4) 100% integrity tested
      5) High flow rates, low pressure  , long service life
      6) Low extractables
      7) Provided prewet option, reducing equipment pre-operation time.

  • Novacon Ultra High Precision Chemical Filter
    Novacon Series are especially designed for acids, bases and other process chemicals as a cost-effective alternative for wet etch and clean applications where low temperature is required....


  • The asymmetric PES membrane provides significant retention of particles(down to 1nm) with additional characteristics including high flow rates, high dirt holding capacity, and longer filter lifetime. In addition, the membrane structure reduces bubbles formation during flow. These filters have high mechanical strength and are suitable for a wide variety of filtration processes.
    Novacon Disposable Filters have an all fluorine construction. Its one-piece structural design makes it easy to install and replace and ensure cleanliness.

    Application
     1) Process : Wet Etch and Cleans
     2) Installation Point : Point of Tool
     3) Low temperature precesses
     4) Chemistry : Dilute acids(such as BOE/DHF/SC2)
     5) Dilute bases (Such as SC1/TMAH); DIW

    Features
     1) Reduce equipment pre-operation time
     2) Excellent retention
     3) Very high flow rates and longer life
     4) Ultralow metal ion extractables option
     5) Manufactured in a cleanroom environment
     6) 100% integrity tested

  • Photopex UPE Nano Level Filter
    With retention ratings 1nm to 5um, Photopex UPE Nano Filter Cartridges ensure excellent retention capabilities, cleanliness and high chemical compatibility to meet the critical demands in semiconductor processes....

  • Using its superior cleaning method, the high purity PE structure ensures cleanliness, low particle shedding and eliminates contaminants, thereby improving removal efficiency. In addition, the filters large surface area provides high flow rates and extended service life.
    Available in a wide variety of sizes and configurations to meet all your requirements. 

    - Application
     1) Photoresist Filtration
     2) Solvent Filtration
     3) Photochemical Filtration
     4) Wet Clean


    - Features
     1) Higher Efficiency
     2) Higher Chemical Compatibility
     3) Better Initial Cleanliness
     4) Ultra-low Metal and Organic Extractables

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