NANOTECH Inc.

Yongin-si, Gyeonggi-do, 
Korea (South)
http://www.nanotek.com
  • Booth: G402

Thank you for visiting our website and your interest in our products and services.


Our vision is to be world leading company in optical measuring sensor solution.


 Products

  • Self-Plasma OES
    소형 Plasma Module을 내장하여 반도체/디스플레이 제조 설비의 배기 라인으로 배출되는 Gas를 분석함으로써 공정 변화 상태를 모니터링하는 센서...

  • 특장점

    √ 국내 시장 점유율 1위 !
    √ 풍부한 해외 납입 실적 (미국,일본,중국 4,000여대)
    √ 내구성 향상을 위한 다양한 기술 보유
    √ 안정적인 시스템 구조 및 데이터 처리 방식
    √ 다양한 공정 적용 경험 및 노하우

    Customer Benefits
     
    √ Technical expertise, all products developed our own technology
    √ Continuous upgrade in the application in response to customer feedback
    √ H/W, S/W customization options available to fit customer needs 

       1. Application 
         - PVD, (PE)CVD, (PE)ALD, Etcher,  all TM @semiconductor/display manufacturing 
        - Ti TM/PM, W PM, WN TM/PM/Ex, TSN TM, C&C(Si etch) TM, OxALD PM, Diffusion PM 
         - In-situ leak detection 
        - ALD Source monitoring 
        - Dry cleaning endpoint optimization 
        - Process fault detection 
        - In-situ fault detection caused by any chamber condition’s changes 
        - Necessary in-situ gas monitoring to prevent unexpected process accident  
     
       2. Features 
        - RF plasma ignition : 0mT~10Torr
        - In-situ monitoring for 200~850nm
        - Use highly sensitive CCD sensor(2,048pixels)
        - Advanced EPD algorithms : Fine leak detection algorithm, Life time management 
     

  • EPD/OES
    반도체/디스플레이 제조 공정 챔버 내부의 Plasma를 분광 분석법으로 분석하여 공정의 종료점을 자동 검출하거나 공정의 변화 상태를 모니터링하는 센서...

  • This is our EPD(End Point Detection)/OES(Optical Emission Spectroscopy) solution designed for detecting endpoint and monitor process state change in the semiconductor and display manufacturing using plasma spectroscopy technology.

    특장점

    √ 낮은 가격 !  최고의 성능 !
    √ 고객 요구 사항에 따른 최적의 모델 제안 및 신속한 커스터마이징
    √ 안정적인 시스템 구조 및 데이터 처리 방식
    √ 다양한 공정 적용 경험 및 노하우


    Customer Benefits

    √ Control the process accurately and stably
    √ Improve production yield-rate
    √ Respose to the changes of process promptly
    √ Available optimized solution for H/W or S/W to detect an endpoint 

    Application 

    √ End Point Detection, Process fault Detection
    √ Dry etcher/Asher/PECVD @Semiconductor/display manufacturing
    √ Increase throughput by determining the optimal etch time
    √ Detect process endpoint through in-situ monitoring optical change in the plasma chamber

    Features 

    √ In-situ monitoring for 200~850nm
    √ Use highly sensitive CCD sensor(2,048pixels)
    √ Advanced EPD algorithms : Differential threshold method, Window method

  • 챔버 플라즈마 모니터
    Pulsed Plasma를 사용하는 Etching, Deposition 등의 공정에서 실제 Pulse 파형이 정확히 유지되고 있는가를 실시간 Monitoring 하는 광학 센서...

  • 특장점 
    √ Time Resolution : 1 micro second !
    √ 1~20kHz 범위의 Pulsed Plasma Repetition Rate 측정
    √ 챔버 외부 Viewport에서 측정하므로 공정에 영향을 끼치지 않는 안전한 방식
    √ 간편한 설치. 도입 및 유지비용 저렴  


    Customer Benefits 

    √ Improve production yield-rate
    √ Separate sensing, not affect the process
    √ Optimized solution for HW/SW to detect plasma fault
    √ Easy and simple to build in low cost 

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