SK Materials Co., Ltd.

Seoul, 
Korea (South)
http://www.sk-materials.com/
  • Booth: C644

Valuable Partner for Everyone, Gas&IT Materials Total Solution Provider


At a time when semiconductors were considered as an unfamiliar business area and when specialty gases used in semiconductor fabrication processes were imported, SK materials became the first Korean company which produces nitrogen trifluoride(NF3), using our own product development capabilities. With continuous challenges and innovation, SK materials aims to grow the companys business beyond the specialty gas market where it is the world’s largest producer of nitrogen trifluoride(NF3) and tungsten hexafluoride(WF6), and also the second largest manufacturer of silane(SiH4). Since SK materials expands into other industrial gases, precursors, etching gas, services, and logistics solutions, it creates even more values.


 Products

  • NF3
    NF3 is used during the manufacturing process of semiconductor, display, and PV, as it removes residues inner wall of the chamber after CVD manufacturing process....

  • NF3 is used during the manufacturing process of semiconductor, display, and PV, as it removes residues  inner wall of the chamber after CVD manufacturing process.
  • WF6
    WF6 is used in patterning semiconductor to form metal contacts and gates....

  • WF6 is used in patterning semiconductor to form metal contacts and gates.
  • SiH4
    SiH4 is used during the manufacturing process of semiconductor, display and PV, where it is employed for Si insulator film and Si anti-reflection layer deposition....

  • SiH4 is used during the manufacturing process of semiconductor, display and PV, where it is employed for Si insulator film and Si anti-reflection layer deposition.
  • SiH2Cl2 (DCS)
    SiH2Cl2 is a gas used for nitride(SixNy) deposition....

  • SiH2Cl2 is a gas used for nitride(SixNy) deposition.
  • Si2H6 (Disilane)
    Si2H6 is used during the manufacturing process of semiconductor, display and PV, where it is employed for Si insulator film and Si anti-reflection layer deposition....

  • Si2H6 is used during the manufacturing process of semiconductor, display and PV, where it is employed for Si insulator film and Si anti-reflection layer deposition.
  • SiH3Cl (MCS)
    SiH3Cl is a precursor material used in the manufacturing of semiconductors and display panels....

  • SiH3Cl is a precursor material used in the manufacturing of semiconductors and display panels.

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