In-line, fully-automated SIMS tool providing on-the-fly composition measurements directly in the semiconductor fab lines.
- Epitaxial (SiGe, SiP) & implant process monitoring
- Blanket & patterned wafer analysis in pad down to 35μm
- SEMI compliant, accessible to non-experts
The new in-line, fully-automated SIMS tool CAMECA : High quality SIMS data without need of SIMS experts.
The new AKONIS platform fills a critical gap in the semiconductor fabrication process by providing a fast tracking of compositional changes and conformity directly in the fab line.
Complementing the IMS Wf / SC Ultra as well as the SIMS 4550 (quadrupole SIMS) currently used to support the semiconductor industry via off-line characterization labs, AKONIS is the only in-line, fully automated Secondary Ion Mass Spectrometer (SIMS) that enables high precision SiGe and SiP process monitoring with no compromise on analytical sensitivity.
AKONIS benefits the most recent development in EXtremely Low Impact Energy (EXLIE) ionic column technology, coupled with a full wafer handling system including a high-resolution stage which permits to address process nodes down to 5nm. Compliant with all automation requests of modern 300mm fabs, the tool provides almost instantaneous composition and doping information in the most complex stacks. Other capabilities include: blanket and patterned wafer measurements in pad down to 35μm. Intuitive recipe creation making SIMS data accessible to non-experts.
Bringing the new AKONIS SIMS tool to the line proves time saving and cost effective: production stands are made shorter as no time is spent waiting for data, and the number of misprocessed wafers is reduced by more frequent monitoring.
For more information, contact cameca.info@ametek.