02-531-7800

AMETEK Korea Co., Ltd.

Suwon-si,  Gyeonggi-do 
Korea (South)
http://www.ametek.com
  • Booth: C128


Metrology & Ultra Precision Analysis for Hi-tech & Mechanics

AMETEK is a leading global manufacturer of electronic instruments and electromechanical devices at more than 150 operating locations, and a global network of sales, service and support locations in 30 countries around the world. AMETEK Korea will participate in SEMICON Korea 2020 with 10 Business Units and adjacent solutions.

1) In-line & Near FAB Analysis for Dose and Distribution of Trace Elements in Thin Film (CAMECA)
2) Active & Passive Floor Vibration Control for Fab & Lab (TMC) 
3) Material Analysis using X-ray  (SEMINET)
4) Surface Analysis of Material (EDAX)
5) Ion Milling and Sample Preparation (Fischione)
6) UHP Tube and Heat Exchanger for High Purity Chemical (CPD) 
7) Permeation Test for Material and Film (MOCON)
8) Defect Detection on Film and Glass (Surface Vision)
9) AC and DC Power (Programmable Power)
10) Trace Element and Isotope Analysis (NU Instruments)
11) Assembly & Packaging (Coining)
12) Weathering Test for Sensor and Camera Module (Atlas)


 Products

  • AKONIS (CAMECA)
    In-line, fully-automated SIMS tool providing on-the-fly composition measurements directly in the semiconductor fab lines. ...

  • In-line, fully-automated SIMS tool providing on-the-fly composition measurements directly in the semiconductor fab lines.

    - Epitaxial (SiGe, SiP) & implant process monitoring

    - Blanket & patterned wafer analysis in pad down to 35μm 

    - SEMI compliant, accessible to non-experts 

    AKONIS

    The new in-line, fully-automated SIMS tool   CAMECA : High quality SIMS data without need of SIMS experts.

    The new AKONIS platform fills a critical gap in the semiconductor fabrication process by providing a fast tracking of compositional changes and conformity directly in the fab line.

    Complementing the IMS Wf / SC Ultra as well as the SIMS 4550 (quadrupole SIMS) currently used to support the semiconductor industry via off-line characterization labs, AKONIS is the only in-line, fully automated Secondary Ion Mass Spectrometer (SIMS) that enables high precision SiGe and SiP process monitoring with no compromise on analytical sensitivity.

    AKONIS benefits the most recent development in EXtremely Low Impact Energy (EXLIE) ionic column technology, coupled with a full wafer handling system including a high-resolution stage which permits to address process nodes down to 5nm. Compliant with all automation requests of modern 300mm fabs, the tool provides almost instantaneous composition and doping information in the most complex stacks. Other capabilities include: blanket and patterned wafer measurements in pad down to 35μm. Intuitive recipe creation making SIMS data accessible to non-experts. 

    Bringing the new AKONIS SIMS tool to the line proves time saving and cost effective: production stands are made shorter as no time is spent waiting for data, and the number of misprocessed wafers is reduced by more frequent monitoring.

    For more information, contact cameca.info@ametek.

  • STACIS® III (TMC)
    STACIS III systems cancel vibrations in real time by continuously measuring floor activity, then expanding and contracting sophisticated piezoelectric actuators to filter out floor motion....

  • Stacis III Active Floor Vibration Cancellation Systems (TMC)

    STACIS® III is a flexible advanced active vibration isolation system. Employing advanced inertial vibration sensors, sophisticated control algorithms, and state-of-the-art piezoelectric actuators, STACIS cancels vibration in real time by continuously measuring floor activity, then expanding and contracting piezoelectric actuators to filter out floor motion.

    Initially designed to isolate precision microlithography, metrology, and inspection equipment in advanced semiconductor factories, STACIS is now the industry standard solution for the most sensitive instruments in noisy environments, including but not limited to semiconductor fabs, failure analysis labs, nanotechnology research, nanofabrication facilities, and materials research.

    STACIS suffers   none of the limitations of air vibration isolation systems. There is no "soft" suspension and, unlike active air systems, STACIS can be placed beneath a tool with an internal active air isolation system with both systems fully optimized.

    The unique serial design and proprietary high-force piezoelectric technology results in a wide active bandwidth   0.6 Hz to 150 Hz and unmatched, truly active vibration isolation with 90% vibration reduction starting at 2 Hz.

    Visit https://www.techmfg.com/products/stacis/stacisiii to learn more.

  • Continuum K3 (GATAN)
    Next-generation Gatan imaging filter with direct detection that enables electron energy loss spectroscopy (EELS) and energy-filtered transmission electron microscopy (EFTEM) applications...

  • By focusing on simplifying the operation of energy-loss systems without sacrificing any of the power or flexibility, the Continuum series enables new levels of productivity and data throughput. Built around new and exclusive detector systems, the Continuum delivers outstanding detector speed and quality for both EELS and EFTEM applications.

    <Continuum K3 Features>

     1) 100 ns electrostatic shutter : Available

     2) 2 kV DualEELS™ : Available

     3) Live STEM EELS mapping : Available

     4) Real-time ZLP stabilization : Available

     5) Integrated BF/DF detector : Available

     6) Centered beam stop : Available

     7) Continuous EFTEM : Available

  • Prisma XRM (SEMINET Sigray)
    Sigray’s Prisma-XRM breaks the barriers of submicron imaging throughput through major innovations based on a principle that has been widely used in astronomy and is being adopted for neutron imaging....

  • Achieving High Resolution with High Power Source and Efficient Detector
    Sigray’s patent-pending approach uses an x-ray source with a microstructured x-ray target in which the x-ray emitting microstructures are arranged in a specific “coded” array that enables decoding during image processing. In this way, each microstructure acts as an independent point source for multibeam tomography. This decouples resolution   throughput. Resolution is related to the size of the microstructure, while throughput is related to the number of microstructures. 
    Tri-contrast Mode: 
    Sigray Prisma-XRM also offers to two additional contrast mechanisms: phase contrast and scattering contrast in addition to sub-micron absorption contrast mode, i.e. tri-contrast imaging capability in a single system. For phase contrast and scatter contrast imaging, phase gratings are incorporated in the Prisma-XRM to provide three orders of magnitude higher contrast than absorption contrast for soft materials and unique sub-resolution information, such as its ability to detect the microcrack inside polymer materials. 
    PRISMA XRM ADVANTAGES WITH TECHNICAL INNOVATIONS:
    1. High Resolution & Throughput: Patterned Microstructured Source achieves 0.5 μm resolution absorption microscopy mode at 5X throughput over leading submicron system 
    2. Tri-Contrast Mode: Talbot-Lau interferometer is adopted for simultaneous acquisition of absorption, phase & scattering contrasts 
    3. Two Systems in One: Dual in-line detectors enables two-color (dual energy band) absorption contrast
  • AQUATRAN Model 3 (MOCON)
    "For OLED" can be measured 5x10-5gm Ultra High-barrier Test. Automated all test procedures / Quick test results / Touch screen The moisture permeability of the flat film and the finished package is measured....

  • <Features and benefits>

    1) Absolute Precision
    -Most efficient water sensor
    -No calibration required

    2) Optimized Productivity
    -Save on labor hours with less in-test monitoring
    -Remote access and control

    3) User Friendly
    -Fully automated temperature and humidity preparation
    -Simplified sample preparation
    -Touch screen interface

    측정범위: 5X10-5(0,00005) ~ 50g/m2 ·day (Max:789g/m2 ·day)
    25X10-8 (0.00000025) ~ 0.025g / pkg·day
    온도조절:10~50°C (Opt.10~85°C)
    상대습도: 5~90%, 100%R.H
    측정샘플수/크기: Two(2)cell / 5or50cm2
    시험규격: ASTM F-3299, ISO 15106-3, DIN 53122-2

  • M1061 SEM Mill (FISCHIONE)
    Ion milling is used in the physical science to enhance the sample’s surface characteristics, inert gas, typically argon, is ionized and then accelerated toward the samples surface....

  • A state-of-the-art ion milling and polishing system. It is compact, precise, and consistently produces high-quality scanning electron microscopy (SEM) samples in the shortest amount of time for a wide variety of applications.
    The ion sources are tilted to provide the desired milling angle. The continuously adjustable ion source tilt angles range   0 to +10 degree. The ion source angles are adjustable using left and right ion source controls. You may choose to use one or both of the truefocus ion sources. If you are using both ion sources, you can adjust the beam angles independently. When both ion beams are directed to one of the sample’s surfaces, milling rates are doubled; this capability is useful for applications such as planar polishing of samples. 
     Although milling at low angles with low ion beam energies reduces sample heating, temperature-sensitive samples may require further cooling. Liquid nitrogen cooling of the sample stage is very effective in eliminating heat-induced artifacts. The SEM Mill can achieve temperatures better than -170 degree. 
     The ion milling process can be monitored in situ in the milling position when using either the stereo or the high-magnification microscope. The viewing window is protected by a shutter, which prevents buildup of sputtered material that could interfere with sample observation.

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