Chemrapid Filter series improve flow performance, cleanliness and contamination control at low wafer defect levels for highly corrosive acids and bases. The modified PTFE membrane enables semiconductor makers to meet their critical chemical filtration requirements.
Chemrapid Filter Series are suitable for filtration of H2SO4, H3PO4, HNO3, HCI, NH4OH, H2O2, TMAH and deionized water at room temperature and SC1, SC2, SPM, metal etching and other applications at high temperatures. Excellent chemical compatibilty and ultra-low metal extractables ensure superior filtration effciency and extended service life. THe non-dewetting PTFE membrane increases the surface energy providing high flow rates and superior filtration efficiency.
Ultra-pure cleanliness reduces equipment sep up time. Its one-piece structural design makes it easy to install and replace.
Available in T, L and In-line configurations which simplify system design.
1) Single Wafer and Batch Processing in advanced technology node
2) Wet Etch and Clean
1) Excellent Chemical Compatibility
2) All fluorine construction makes it suitable for the filtration of highly corrosive high temperature chemicals
3) Suitable for critical condition
4) 100% integrity tested
5) High flow rates, low pressure , long service life
6) Low extractables
7) Provided prewet option, reducing equipment pre-operation time.