Merck Performance Materials Ltd.

Korea (South)
  • Booth: D420

We are delivering Integrated Materials Solutions.

Merck is a leading science and technology company in healthcare, life science and performance materials with 354 years of history.
Merck is a leading global producer of high quality, high-purity specialty chemical materials for the fast growing electronics market. Merck develops, manufactures, and markets a complete line of photoresist and insulation materials (193-nm, deep-UV, i-line, g-line, crossover, broadband, thick film) for semiconductor and flat-panel display applications. The company also offers top and bottom antireflective coatings, chemical shrink materials, anti-collapse special rinse solutions, strippers, developers, edge bead removers, and spin-on dielectric materials. Merck supports leading global electronics players to enhance existing processes and innovate new products.


  • 감광제 (Photoresists)
    Photoresists are light-sensitive materials used in several industrial processes, such as photolithography and photoengraving to form a patterned coating on a surface....

  • Photoresists are either positive tone or negative tone and most pervasively used in the manufacture of integrated circuits and flat panel displays. Materials for the integrated circuit industry can be used for a wide variety of lithographic processes covering a wide range of exposure tools and processes. Applications range   sub-micron geometries to thick film applications. All materials are spin coated and can be matched to a large variety of substrates. Materials for the flat panel display industry can also be used for a wide variety of processes. Applications extend beyond the 5th generation spin coating, into advanced slit-coating processes. Materials are also available for roller coating and extrusion coating.
  • 스핀-온 유전체 (Spin-on Dielectrics)
    Spin-on Dielectrics or AZ® Spinfil® SOD Series is a Poly (perhydrosilazane) - (SiH2NH) based inorganic SOD material to be used for gapfilling and in planarization applications in advanced device manufacturing....

  • AZ® Spinfil® SOD Series can be converted to SiO2 based film which has similar properties to high performance CVD. AZ® Spinfil® SOD Series is the industry-standard material and is used as the dielectric technology for FEOL gapfilling applications in advanced device manufacturing.
  • 케미컬 슈링크 포뮬레이션 (Chemical Shrink Formulations)
    Chemical shrink coatings (RELACs) are water based polymer products that are used to shrink openings defined by the photoresist pattern....

  • This product enables defined features to be shrunk by up to 60nm with existing lithography equipment. Therefore, with this product, 248nm or 193-dry technology can be extended to substantially lower feature sizes without investing in new scanner technology.
  • 반사방지막 (Anti-reflective coatings)
    Anti-reflective coatings are used in the lithography process to improve the photoresist profile and reduce the line width variation caused by scattering and reflecting light....

  • Anti-reflective coatings are used in the lithography process to improve the photoresist profile and reduce the line width variation caused by scattering and reflecting light.
  • 붕괴방지 린스 (Anti-collapse Rinses)
    Anti-collapse rinse products provide wider process window capabilities for advanced 193nm photoresists....

  • By applying the anti-collapse rinse after the photoresist development and DI water rinse steps, the pattern collapse behavior is significantly improved. Thus the photoresist film thickness can be increased to a level suitable for the substrate etch process while maintaining a manufacturable process window.
  • Klebosol 콜로이드 실리카 (Klebosol Colloidal Silica)
    Klebosol is a leading brand of multipurpose colloidal silica....

  • Klebosol is with applications in a diverse array of industries ranging   beverage to electronics. The Klebosol range of colloidal silica products are stable suspensions of independent (non-agglomerated), non-porous and spherical particles of silica (SiO2).

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