Allwin21 Corp.

The AccuThermo AW610 was derived from the AG Associates 610 production-proven design.  Allwin21 Corp. is the exclusive manufacturer of the AG Associates Heatpulse 610 desktop atmospheric RTP (Rapid Thermal Processing) system.  The system uses high intensity visible radiation to heat single wafer for short process periods of time at precisely controlled temperatures. The process periods are typically 1‑600 seconds in duration, although periods of up to 9999 seconds can be selected. These capabilities, combined with the heating chamber's cold-wall design and superior heating uniformity, provide significant advantages over conventional furnace processing.

1. 35 years’ production-proven Real RTP/RTA/RTO/RTN system.

2. Scattered IR light by special gold plated Al chamber surface.

3. Allwin21 advanced Software package with real time control technologies and many useful functions.

4. Consistent wafer-to-wafer process cycle repeatability.

5. Top and bottom High-intensity visible radiation Tungsten halogen lamp heating for fast heating rates with good repeatability performance and long lamp lifetime.

6. Cooling N2 (Or CDA) flows around the lamps and quartz isolation tube for fast cooling rates

7. Elimination of external contamination

8. Up to six gas lines with MFCs and shut-off valves

9. Energy efficient.

10. Made in U.S.A.

11. Small footprint

The AW-105R single-wafer photoresist asher and descum is an automated tool designed as a flexible 13.56MHz RF Parallel Plate plasma photoresist removal and descum system for high-volume wafer fabrication. The AW-105R is in direct response to manufacturer’s concerns for wafer uniformity, uptime, reliability and production-proven technology.

1. Production-proven plasma Asher/Descum system.

2. Integrated solid robotic wafer handling, Single wafer process.

3. Up to 3%-5% Uniformity. Best for III-V Materials.

4. Frontside and backside isotropic removal.

5. Consistent wafer-to-wafer process cycle repeatability.

6. Element heating for up to 250^oC.

7. 50mm-150mm wafer capability. Up to 6.25” substrate.

8. Up to 4 wafer size capability without hardware change.

9. Fixed cassette station and wafer aligner/cooling station.

10. Can handle 50um thickness wafer.

11. PC controller with Advanced Allwin21 Software.

12. Endpoint detection (EOP) with Allwin21 SLOPE technology (Optional).

13. Up to 3 gas lines with MFC.

14. Air-Cooled 600W MKS 13.56 MHz RF Generator (300W Option).

15. Pressure control with Throttle Valve.

16. 15-inch Touch screen monitor GUI.

17. EMO, Interlocks, and Watchdog function.

18. GEM/SECS II (optional).

19. Small Footprint: 27”W x 40”D x 59”H(280LBs)

20. Made in U.S.A.

The AW-901eR & AW-903eR single-wafer dry etchers are automated tools designed as a flexible 13.56MHz RF Parallel Plate plasma etching systems for high-volume wafer fabrication. AW-901eR & AW-903eR are in direct response to manufacturer’s concerns for wafer breakage, Uniformity, Uptime, Reliability, and Production-Proven technology.

1. Production-proven plasma etching system.

2. Up to 3%-5% Uniformity.

3. Frontside and backside isotropic and anisotropic etch.

4. Process Temperature: 6-65°C .

5. 75mm-150mm wafer capability.

6. Integrated solid robotic wafer handling. Single wafer process.

7. Fixed cassette station and wafer aligner/cooling station.

8. Can handle 50um thickness wafer.

9. PC controller with Advanced Allwin21 Software.

10. Endpoint detection with Allwin21 SLOPE technology. (Optional)

11. Up to 4 gas lines with MFC’s.

12. MKS 13.56 MHz RF Air-Cooled Generator 300W, 600W, or 1000W.

13. Pressure control with UPC. Throttle valve is optional.

14. Touch screen GUI.

15. EMO, Interlocks, and Watchdog function.

16. GEM/SECS II (Optional)

17. Small Footprint

18. Made in U.S.A.

Allwin21 Corp. is a leading supplier of sputter deposition equipment for high technology applications for Semiconductor III-V, II-VI, MEMS, Biomedical, Nanotechnology, Solar, Battery & LED industries. The AccuSputter AW 4450 is designed for flexibility offering a wide range of operating and process modes. The highest quality construction, components and Allwin21's new real time AW-4450 System Control assure reliable operation and an ultra clean vacuum environment to yield consistently reproducible results. Every AccuSputter AW 4450 sputtering system is supported by years of technological experience and backed by a worldwide sales and service organization dedicated to prompt courteous service

1. Production-proven sputter technology

2. Optimum AW-4450 System Control

3. DC 24V for Motors, Actuator, Relay, Solenoid

4. Efficient 8" Delta cathodes, 2 to 6" option

5. Full Pallet rotation control with “indexing”

6. High Uniformity and Yield

7. DC, RF Sputter, Pulse DC option

8. Magnetron and Diode Sputter option

9. RF Etch and Bias are optional

10. Ultra Clean vacuum system

11. Load lock operation

12. UHV design

13. Flexible for development or production use

14. Full range of substrate sizes and shapes

15. Various pumping and power options

16. Co-sputtering option

17. Reactive Sputtering option