Axcelis Technologies

Beverly,  MA 
United States
  • Booth: D704

Enabling Intelligent Connectivity

Axcelis is dedicated to developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the most critical and enabling steps in the IC manufacturing process.

 Press Releases

  • New High Current and High Energy Implanters Feature Enabling Technology for Emerging Markets
    BEVERLY, Mass., Sept. 19, 2019  Axcelis Technologies, Inc. (Nasdaq: ACLS), a leading supplier of innovative, high-productivity solutions for the semiconductor industry, announced today the introduction of three new additions to the Purion Platform. The new products include:
    ? Purion H200™ high current implanter designed to provide a comprehensive solution for high dose, higher energy applications in power device manufacturing
    ? Purion Dragon™ revolutionary new high current implanter architecture, featuring innovative orthogonal beam optics, designed for advanced memory and logic applications
    ? Purion XEmax™ high energy implanter, featuring patented Boost Technology™, designed for the most advanced image sensor applications
    All Purion ion implanters are based on a high-performance common platform, which enables Axcelis to leverage innovative designs that enable R&D across all product lines more efficiently and cost effectively, and provides customers with the best technology.
    Executive Vice President, Product Development, Bill Bintz, commented, “We’re excited to introduce the next wave of Purion innovation.  We continue to   on our market segmentation strategy to expand the Purion platform with product extensions featuring enabling technology for high growth, emerging markets. These new Purion products are designed to create sustainable, competitive differentiation to support our customers’ high value, high impact implant challenges.  We are confident these new systems will fuel growth as the market recovers.”
    The Company plans to unveil the new products at an Axcelis Investor Day for the professional investment community, to be held   2:00 p.m. ET to 5:00 p.m. ET on Tuesday, September 24, 2019.  The event will be held at the Nasdaq MarketSite in New York City. The event will include presentations   the Company’s executive team followed by a reception. A copy of the presentation will be available on the Company website,  All executive officers will be in attendance.  This event is by invitation only. Members of the professional investment community who wish to attend the event and reception are asked to contact investor relations at (978) 787-4079 or via email at
    About Axcelis:
    Axcelis (Nasdaq: ACLS), headquartered in Beverly, Mass., has been providing innovative, high-productivity solutions for the semiconductor industry for over 40 years. Axcelis is dedicated to developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the most critical and enabling steps in the IC manufacturing process. Learn more about Axcelis at


  • Purion M Series
    Medium Current Ion Implanter...

  • Purion M ion implanters offer the broadest spectrum of mid-current doses available, offering unparalleled flexibility to meet today’s evolving implant requirements. With high energy capability far beyond competitive implanters, the Purion M is ideal for fabs at higher elevations or those dealing with heavy air mass species. Yet it’s 20% more energy efficient than competing platforms, contributing the industry’s lowest cost of ownership.
  • Purion XE Series
    High Energy Ion Implanter...

  • Our Purion XE series of ion implanters have rapidly earned a reputation as the industry standard for today’s demanding high energy recipes. Their unique RF Linear Accelerator (LINAC) technology offers higher reliability, a wider energy range and greater reliability than competing platforms, with superior metals contamination control.
  • Purion H Series
    High Current Ion Implanter...

  • Purion H ion implanters bring the industry-leading process control of our medium current platforms to the full range of demanding, high-current applications. The flexibility of the platform enables us to tailor Purion H to the specific energy or dosing requirements of your application. The Purion H offers unmatched versatility, throughput and uniformity, so you can achieve greater yield with the lowest cost of ownership.

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