FOURES Co., Ltd.

The UCHEM T-50 is LDS (Liquid Delivery System) equipment that can safely supply a variety of chemicals used in the semiconductor manufacturing process to processing facilities at a constant pressure using carrier gas, and it can provide an uninterrupted supply of gas.

UCHEM T-50 equipment safely supplies special high-purity chemicals to processing facilities. The UCHEM T-50 distributes a specified amount of chemicals at a constant pressure using carrier gas and it can continuously supply these chemicals to a number of processing facilities. The UCHEM T-50 has obtained various safety certification required at home and abroad, and is equipped with an automatic shut-off and exhaust device to ensure the safety of users in an emergency. Safety is further enhanced by attaching various sensors that are suitable for the properties of the chemicals in use.
The UCHEM T-50 is configured and programmed for complete cleaning when replacing the canisters that store chemicals, and it is also equipped with a safety interlock function that stops the process when a target value cannot be reached during the process.
The UCHEM T-50 can be used for any equipment that requires a stable and safe supply of special high-purity chemicals, and it is mainly used the semiconductor processing process. Chemicals can be supplied to the processing equipment using two methods, supplying a precursor through a canister or receiving it directly from the outside. 
The precursors supplied by UCHEM T-50 are mainly used in the deposition part of semiconductor processing. 
The deposition process coats a thin film on a silicon substrate (wafer). In the process, the film is very thin (μm level) so it is difficult to process using simple processing methods. Special methods must be employed to process this thin film, which cannot be created with simple processing. Chemical vapor deposition (CVD) is one of those methods. As the word “chemical” implies, this deposition method requires chemicals. The UCHEM T-50 is designed to supply chemicals stably for chemical vapor deposition. 

UCHEM T-80 is LDS (Liquid Delivery System) equipment that can safely supply a variety of chemicals used in the semiconductor manufacturing process to processing facilities at a constant pressure using carrier gas, and it can provide an uninterrupted supply of gas. UCHEM T-80 has a solvent cleaning function.
 

UCHEM T-80 equipment safely supplies special high-purity chemicals to processing facilities. The UCHEM T-80 distributes a specified amount of chemicals at a constant pressure using carrier gas and it can continuously supply these chemicals to a number of processing facilities.  UCHEM T-80 has obtained various safety certification required at home and abroad, and is equipped with an automatic shut-off and exhaust device to ensure the safety of users in an emergency. Safety is further enhanced by attaching various sensors that are suitable for the properties of the chemicals in use.
The UCHEM T-80 has a solvent cleaning function, and has the advantage of being used for chemicals with low vapor pressure that cannot be completely cleaned through a gas purge.
The UCHEM T-80 is configured and programmed for complete cleaning when replacing the canisters that store chemicals, and it is also equipped with a safety interlock function that stops the process when a target value cannot be reached during the process.
The UCHEM T-80 can be used for any equipment that requires a stable and safe supply of special high-purity chemicals, and it is mainly used the semiconductor processing process. Chemicals can be supplied to the processing equipment using two methods, supplying a precursor through a canister or receiving it directly from the outside. The precursors supplied by UCHEM T-80 are mainly used in the deposition part of semiconductor processing. 
The deposition process coats a thin film on a silicon substrate (wafer). In the process, the film is very thin (μm level) so it is difficult to process using simple processing methods. Special methods must be employed to process this thin film, which cannot be created with simple processing. Chemical vapor deposition (CVD) is one of those methods. As the word “chemical” implies, this deposition method requires chemicals. The T-80 is designed to supply chemicals stably for chemical vapor deposition.