Park Systems Corp.

Korea (South)
  • Booth: D926

Meet the world’s best nanotechnology, Park Systems AFM!

Park Systems is a global manufacturer of atomic force microscopy systems, also known as AFM, and emerging nanoscale microscopes.

Our customers include almost all major universities and national labs around the world, all leading semiconductor and data storage companies, and many other companies throughout various industries.

We have the most comprehensive line of AFM and related nanoscale microscopy products, ranging from general purpose research products to high end large automated AFM systems valued over a million dollars.

Park Systems’ line of AFM for the Semiconductor Industry offer Failure Analysis methods unsurpassed in the industry, with 4 out of 5 of the leading wafer manufacturers using the Park AFM system.

We welcome you to browse our website and let us know how we can help you with nanometrology solutions.

 Press Releases

  • 파크시스템스는 최근 반도체 후공정 및 패키징 분야에서 3D 측정에 사용되는 White light Interferometry (WLI) 모듈을 자체 개발하여, 이를 기존의 전자동산업용 AFM에 (full automation industrial) 결합한 NX-Hybrid WLI 장비를 산업용 장비 제품군에 추가 하였습니다.

    이번에 개발된 WLI 모듈은 기존의 파크시스템스의 원천기술인 AFM의 초정밀 제어기술을 접목하여 타사의 기존 WLI 제품보다 정밀도에서 많은 개선을 가져온 제품입니다.

    WLI 기술은 0.1 나노미터의 초정밀 높이(vertical) 분해능과 AFM 대비 고속 측정이 가능한 장점이 있는 반면, 광학 분해능 한계로 인해 공간 분해능이 수백 나노미터 수준이고, 빛이 투과하는 투명한 물질에는 사용이 어렵다는 단점이 있어 주로 수 마이크로미터 이상 크기의 구조물의 3D 측정에 주로 사용되고 있습니다.

    파크시스템스가 이번에 개발한 NX-Hybrid WLI 장비는 WLI와 AFM 기술을 하나의 장비로 통합한 세계 최초의 하이브리드 장비로써, 각각의 기술의 단점을 상호 보완하여 반도체 후공정 및 패키지 분야 뿐만 아니라 반도체 전공정에서도 나노 구조물을 빠르고 정밀하게 측정 가능한 솔루션을 제공할 수 있는 장비 입니다.

    특히 WLI와 AFM이 동시에 필요한 고객에게는 하나의 장비에서 두 가지 측정을 수행할 수 있어 클린룸 내에서의 시간과 공간의 절약 및 비용을 절약할 수 있는 장점을 가지고 있습니다.

    Park NX-Hybrid WLI 영상 보기

  • (20220127)


  • Park NX-Hybrid WLI
    The new Park NX-Hybrid is part of a series of hybrid metrology products Park Systems plans to offer this year to enhance and improve the utilization of atomic force microscopy across a wide range of industrial and academic research applications....

  • The fully automated industrial WLI-AFM system

    Park NX-Hybrid WLI is the first-ever AFM with built-in WLI profilometry for semiconductor and related manufacturing quality assurance, process control for semiconductor front-end, back-end up to advanced packaging, and R&D metrology. It is for those that require high throughput measurements over a large area that can zoom down to nanometer-scale regions with sub-nano resolution and ultra-high accuracy.

    The two best complementary technologies for semiconductor metrology

    - WLI: White light interferometry is an optical technique that can image a very wide area, very fast, producing high throughput measurements.

    - AFM: Atomic force microscopy is a scanning probe technique that delivers the highest nanoscale resolution measurements even for transparent materials.

    NX-Hybrid WLI features

    Park WLI System

    • - Park WLI supports WLI and PSI modes (PSI mode is supported with Motorized Filter Changer)

    • - Available objectives lens magnification: 2.5X, 10X, 20X, 50X, 100X

    • - Two objective lenses can be automatically replaced by Motorized Linear Lens Changer

    • WLI Optical Interferometry

    • - The height of sample surface at each pixel can be calculated from the light intensity variation due to interference while scanning the height of Mirau objective lens

    • - White light interferometry (WLI) and phase shifting interferometry (PSI) are two popular techniques for surface characterization

    • NX-Hybrid WLI Applications

    • Fast survey of hotspots and automated review of hotspot defects

    • - Hotspots of a patterned structure can be detected by comparing images of reference and target sample areas

    • - High speed “hotspot detection” by WLI enables fast localization for defect sites for high resolution AFM review

  • Park NX-Wafer
    The Park NX-Wafer is the only wafer fabrication AFM with automatic defect review. This gives it the power to increase the throughput of your lab while ensuring a high level of accuracy and quality control when scanning wafers up to 300mm in size....

  • The only wafer fab AFM with automatic defect review

    Fully automated AFM solution for defect imaging and analysis that improves defect review productivity by up to 1,000%

    Park's Smart ADR provides fully automated defect review and identification, enabling a critical inline process to classify defect types and source their origin through high resolution 3D imaging.
    Designed specifically for the semiconductor industry, Smart ADR is the most advanced defect review solution available, featuring automatic target positioning without the need for labor intensive reference marks that often damage the sample. The Smart ADR process improves productivity by up to 1,000% compared to traditional defect review methods. Additionally, the new ADR capability offers up to 20x longer tip life thanks to Park's groundbreaking True Non-Contact™ Mode AFM technology.


    Low noise Atomic Force Profiler for accurate, high throughput CMP profile measurements

    The industry leading low noise Park AFM is combined with a long range sliding stage to become an Atomic Force Profiler (AFP) for chemical mechanical polishing (CMP) metrology. The new low noise AFP provides very flat profiling for both local and global uniformity measurements with the best profiling accuracy and repeatability on the market. Unique True Non-Contact™ mode enables nondestructive in-line measurements with much longer tip life, while Park's innovative True Sample Topography™ obtains CMP profiles without the usual artifacts associated with a traditional piezotube-based AFP. This guarantees accurate height measurements with no non-linear or high noise background subtraction over a wide range of profiling lengths.

    Sub-Angstrom surface roughness measured with extreme accuracy and minimized tip-to-tip variation

    The surface roughness of a wafer is critical in determining the performance of a semiconductor device. For the state-of-the-art device manufacturer, both chip makers and wafer suppliers are demanding more accurate roughness control of ultra-flat surface on Si or SOI wafers. By delivering the industry’s lowest noise floor of less than 0.5 Å and combining it with True Non-Contact™ mode, Park NX-Wafer can reliably acquire sub-Angstrom roughness measurements with minimum tip-to-tip variation. Park's Crosstalk Elimination also allows very flat orthogonal XY scanning with no background curvature, even on the flattest of surfaces regardless of scan location, rate, and size. This enables very accurate and repeatable surface measurement from micro-roughness to long-range waviness.

  • Park FX40
    Park FX40 Atomic Force Microscope is the first AFM to autonomously execute all up-front set up and scanning processes, putting the intelligent Park FX40 in a groundbreaking new class of atomic force microscope....

  • Park Systems, the fastest growing manufacturer of Atomic Force Microscopes (AFM) just announced Park FX40, a groundbreaking autonomous atomic force microscope, infused with innovative robotics, intelligent learning features, safety mechanisms, AI based software and specialized add-ons. Park FX40 Atomic Force Microscope is the first AFM to autonomously execute all up-front set up and scanning processes, putting the intelligent Park FX40 in a groundbreaking new class of atomic force microscope.

    "Unlike current generations of AFM systems, Park FX40 takes care of all the set up before and during scanning: the probe exchange, probe identification, beam alignment, sample location, tip approach and imaging optimization to name a few. All the tedious and time-consuming manual processes are now a thing of the past," comments Ryan Yoo, Vice President Product Development. "Park FX40 performs all these tasks autonomously, by integrating AI intelligence into the system and incorporating robotics techniques that Park has mastered with their industry leading multimillion dollar automated AFM systems."

    The new Park FX40 Atomic Force Microscope is more than just dozens of new features and upgrades – it's an overhaul in functionality while retaining the same basic design elements, enabling AFM's to think and perform essential functions completely on their own. This will allow untrained researchers to achieve a number of formerly training-intensive tasks, and trained researchers to focus on what they're best at in their specialized fields, while the menial tasks like choosing and loading the correct probes, to automatically aligning the X, Y and Z beams along the axis, take care of themselves.

    "Park FX 40 features significant enhancements that are completely new tech, never before seen on an AFM," adds Yoo.

    Furthermore, Park FX40 has drastically upgraded many of the AFM's key aspects, including electromechanics for much reduced mechanical noise, smaller beam spot size, improved optical vision and multi snap-in sample chuck. Park FX 40 Atomic Force Microscopes are now located at key locations worldwide and will are now available for purchase.

    "We are thrilled to be the first AFM user in North America to experience the Park FX40 Atomic Force Microscope, states James Hone, Professor of Mechanical Engineering at Columbia University. "As long-time users of Park AFMs, we are excited about the new features and increased capabilities in this new generation. In particular, the breakthroughs in automation of AFMs using artificial intelligence and robotics technology will dramatically boost our productivity and drive innovation across the field of nanometrology."

    Park FX built in intelligence even allows users to place several samples at the onset (of the same or different types) and it will image them autonomously according to your requirements. The result is better research by obtaining publishable data easily and timely and acceleration of the research cycle for ultimate scientific and engineering success. Park FX40's unique environmental sensing self-diagnostics and head crash avoidance system ensures that Park FX40 is continuously operating at its optimum performance.

    In collaboration with the expert scientists at Park's growing network of nanotechnology research centers worldwide, the product marketing team diligently worked on the design of Park FX over the last year."Our scientists recognize the impact AFM has had on nanoscience innovation, allowing researchers to obtain scientific data never before witnessed," comments Dr. Sang-il Park , CEO and Founder of Park Systems. "Our ultimate goal with developing Park FX with autonomous features is to make the researcher's job easier as they open new doors in scientific discovery."

    Known for their commanding lead in semiconductor advanced automated AFM systems and bringing AFM technology into the mainstream as the premier tool for nanoscale metrology, this latest development is part of a natural progression for Park Systems as they continue to lead the world in AFM innovation.

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