Fremont,  CA 
United States
  • Booth: B512

Pivotal Systems provides the best-in-class gas flow monitoring and control technology platform for the global semiconductor industry. The company’s proprietary hardware and software utilizes advanced machine learning to enable preventative diagnostic capability resulting in an order of magnitude increase in fab productivity and capital efficiency for existing and future technology nodes. 

The platform includes Pivotal’s Gas Flow Controller (GFC) product lines that offer industry leading speed down to ≤ 10msec on/off and high-accuracy, real-time monitoring and control of the most critical parameters difficult to control in wafer processing today: Gas Flow and Chamber Condition.

IDMs, foundries and OEMs use Pivotal’s products to dramatically improve yield and productivity by avoiding catastrophic scrap events, tightening process windows and matching chambers more effectively.  To meet strong industry demand, Pivotal Systems now operates high-capacity manufacturing facilities in the United States and Korea, and the company has annually doubled its total unit production each year since 2014.

 Press Releases

  • Pivotal Systems, the leading provider of best-in-class monitoring and process control technology for the semiconductor manufacturing industry, is presenting the industry’s fastest flow controller, the Pivotal Gas Flow Controllers (GFC) at SEMICON KOREA 2022. The GFC is field proven and shipping in high volumes with response speeds of <100msec, three times faster than competitive mass flow controller technologies available today.

    “Having the fastest and most accurate flow controller available today enables the leading plasma etch, atomic layer processing (ALD/ALE) capital equipment companies to meet their technology roadmaps,” said Joseph Monkowski, CTO for Pivotal Systems. “We are seeing advanced processes specifically for ALD and ALE requiring high throughput and high yield, driving the need for higher control speeds. Not only are customers using us for speed, but also for our advanced diagnostics and our automated in-situ NIST traceable flow calibration that eliminates the need for pulling the gas flow controller off for recalibration.”

    Pivotal’s full product line of Gas Flow Controllers (GFC) offers both the highest accuracy and real-time monitoring and control of the most critical gas flow parameters in wafer processing today. Leading IDMs, foundries and OEMs use Pivotal’s products to dramatically increase yield and productivity by avoiding catastrophic scrap events, tightening process windows, and matching chambers and eliminating the need for offline flow calibration.

    “We see our GFC as yet another game changer because there are no other technologies in the market today that can flow accurately at these high speeds with nanometer control that enables industry leading precision and increases productivity,” said Kevin Hill, COO for Pivotal Systems.


  • Pivotal GFC
    Pivotal Systems’ GFC enables higher yield and higher throughput in advanced wafer processing with <100msec response, high accuracy, wide control range, and self-calibration....

  • As process geometries within the semiconductor industry continue to shrink to 3 nm and beyond, the need for highly accurate, responsive and repeatable gas flow control during wafer processing is essential. With the emergence of low gas flow rates, short processing times and continuous plasma processing, traditional best-in-class MFCs are unable to meet the accuracy, speed, and repeatability requirements demanded to ensure high yield and matched chambers.

    Pivotal Systems’ GFC paves the way for the future of gas flow control. The GFC combines Pivotal’s patented, high accuracy GFM™ system with patented control valve technology. As such, it exceeds all performance standards of current MFC technologies by offering an order of magnitude improvement on gas flow accuracy, speed, diagnostics, and self-calibration, thereby enabling higher yields and higher throughput in today's advanced wafer-manufacturing processes such at ALD, ALE, and ETCH.

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