The FCTO is designed to accommodate a toatl gas flow up to 700, and 2000SLM respectively, depending on mode.
This system naintains the catalyst zone at a high temperature uniformly by electric heater and waste gas reaction heat without combusion of addtional fuel(LNG), thus;thermal NOx is rarely generated.
Powder and water-soluble gases which can be genterated during thermal oxidation will be captured by multi-stage wetting zone.
In case of PM, cartridge does not open on site and it is replaced and retrieved. Therefore system is maintained and managed conveniently without contamination of FAB.
A PLC controlled color touch screen will help you access system operation easily.
FCTO700W is ideal for CVD process(using NF3 as cleaning gas) in semiconductor.
FCTO2001W is specially designed for AMOLEND process using large amount of powder generating gas and NF3.