The only wafer fab AFM with automatic defect review

Low Noise, High Throughput Atomic Force Profiler

Park NX-Wafer is the industry’s leading automated AFM metrology system for semiconductor and related fabrications. It provides wafer fab inspection and analysis, automatic defect review for bare wafers and substrates, and CMP profile measurements. Park NX-Wafer has the highest nanoscale surface resolution with sub-angstrom height accuracy, scan after scan with negligible tip to tip variation and preserved tip sharpness unmatched by others.
Park NX-Wafer with its automated system features including auto tip exchanger, live monitoring, target positioning without reference marks and auto analysis makes the best semiconductor AFM tool in the industry.

• - Low noise atomic force profiler for more accurate CMP profile measurements
• - Sub-Angstrom surface roughness measurements with extreme accuracy and negligible tip-to-tip variation
• - Fully automated AFM solution for defect imaging and analysis
• - A fully automated system with auto tip exchange, robot wafer handler
• - Capable of scanning 300 mm wafers

The fully automated industrial WLI-AFM system

Park NX-Hybrid WLI is the first-ever AFM with built-in WLI profilometry for semiconductor and related manufacturing quality assurance, process control for semiconductor front-end, back-end up to advanced packaging, and R&D metrology. It is for those that require high throughput measurements over a large area that can zoom down to nanometer-scale regions with sub-nano resolution and ultra-high accuracy.

The two best complementary technologies for semiconductor metrology

• - WLI: White light interferometry is an optical technique that can image a very wide area, very fast, producing high throughput measurements.
• - AFM: Atomic force microscopy is a scanning probe technique that delivers the highest nanoscale resolution measurements even for transparent materials.

• NX-Hybrid WLI features

• Park WLI System

• - Park WLI supports WLI and PSI modes (PSI mode is supported with Motorized Filter Changer)
• - Available objectives lens magnification: 2.5X, 10X, 20X, 50X, 100X
• - Two objective lenses can be automatically replaced by Motorized Linear Lens Changer

• WLI Optical Interferometry

• - The height of sample surface at each pixel can be calculated from the light intensity variation due to interference while scanning the height of Mirau objective lens
• - White light interferometry (WLI) and phase shifting interferometry (PSI) are two popular techniques for surface characterization

• NX-Hybrid WLI Applications

• Hotspot Detection and Review

• - Hotspots of a patterned structure can be detected by comparing images of reference and target sample areas
• - High speed “hotspot detection” by WLI enables fast localization for defect sites for high resolution AFM review

Park NX-Mask

An AFM-based EUV Mask Repair and More

Park NX-Mask is the new generation photomask repair system that addresses
the latest challenges of shrinking device geometries and increasing photomask
complexities. Park NX-Mask is an innovative tool for the repair of high-end
EUV Mask incorporating advanced atomic force microscopy technology.
It provides all in one solution from auto defect review to repair of defects to
verification of the repair, accelerating the throughput at unprecedented repair efficacy.

Park FX40 Atomic Force Microscope is the first AFM to autonomously execute all up-front set up and scanning processes, putting the intelligent Park FX40 in a groundbreaking new class of atomic force microscope.

The new Park FX40 Atomic Force Microscope is more than just dozens of new features and upgrades – it's an overhaul in functionality while retaining the same basic design elements, enabling AFM's to think and perform essential functions completely on their own. This will allow untrained researchers to achieve a number of formerly training-intensive tasks, and trained researchers to focus on what they're best at in their specialized fields, while the menial tasks like choosing and loading the correct probes, to automatically aligning the X, Y and Z beams along the axis, take care of themselves.

Furthermore, Park FX40 has drastically upgraded many of the AFM's key aspects, including electromechanics for much reduced mechanical noise, smaller beam spot size, improved optical vision and multi snap-in sample chuck. Park FX 40 Atomic Force Microscopes are now located at key locations worldwide and will are now available for purchase.

Park FX built in intelligence even allows users to place several samples at the onset (of the same or different types) and it will image them autonomously according to your requirements. The result is better research by obtaining publishable data easily and timely and acceleration of the research cycle for ultimate scientific and engineering success. Park FX40's unique environmental sensing self-diagnostics and head crash avoidance system ensures that Park FX40 is continuously operating at its optimum performance.

Known for their commanding lead in semiconductor advanced automated AFM systems and bringing AFM technology into the mainstream as the premier tool for nanoscale metrology, this latest development is part of a natural progression for Park Systems as they continue to lead the world in AFM innovation.