It's the first system to use non-linear optical Second Harmonic Generation (SHG) for interface charge state metrology and detecting changes in crystalline and film properties.
Compared to traditional linear optical inspection systems, SHG offers the capability to detect previously undetected process variations and excursions due to its interfacial specificity and crystallographic sensitivity.
By providing a non-destructive methodology for detecting these process shifts, SHG can expedite time to market for new products, improve process control and yield while helping to reduce manufacturing costs and enhance end product reliability.
Key Features:
- Patented Second Harmonic Generation (SHG)
- Non- linear Optics with Unique Detection Capabilities
- Fast, Non-contact, Non-Destructive Metrology
- Patterned Wafers and Bare / Blanket Film Wafers
Metrology Capabilities:
- Interface Charge State Measurement
- Crystalline and Film Property Measurement
Application Examples:
- Charge State for High-k / Silicon Interfaces
- SiGe Strain / Ge % Metrology for Advanced Logic
- Selective Epi Height for Advanced 3D NAND
- Process Induced Charge (Memory or Logic)
- Interface Charge states for BSI Passivation