Park Systems Corp.

Suwon,  Korea (South)
http://www.parksystems.com
  • Booth: C836

Enabling Nanoscale Advances, Park Systems

Overview

Park Systems Corporation is the industry leader in manufacturing nanoscale microscopy and metrology solutions. Its comprehensive range of products includes atomic force microscopy (AFM), white light interferometry (WLI), nanoinfrared spectroscopy (NanoIR), and imaging spectroscopic ellipsometry (ISE) systems. The company’s commitment to excellence has resulted in the development of several groundbreaking innovations, including True Non-Contact Imaging, 3D metrology, and fully automated AFM systems that are able to cater to both research and industrial needs.
Park Systems products offer extensive application potential within the fields of scientific research, nanoscale engineering, semiconductor fabrication, and quality assurance. The company’s ongoing dedication has earned Park Systems the status of the most preferred choice for nano-metrology products among the leading semiconductor companies, renowned scientific research universities, and national labs.

  Products

  • Park NX-Wafer
    Low Noise, High Throughput Atomic Force Profiler with Automatic Defect Review...

    • Park NX-Wafer is the industry’s leading automated AFM metrology system for semiconductor and related fabrications. It provides wafer fab inspection and analysis, automatic defect review for bare wafers and substrates, and CMP profile measurements. Park NX-Wafer has the highest nanoscale surface resolution with sub-angstrom height accuracy, scan after scan with negligible tip to tip variation and preserved tip sharpness unmatched by others.
    Park NX-Wafer with its automated system features including auto tip exchanger, live monitoring, target positioning without reference marks and auto analysis makes the best semiconductor AFM tool in the industry.

    - Low noise atomic force profiler for more accurate CMP profile measurements

    - Sub-Angstrom surface roughness measurements with extreme accuracy and negligible tip-to-tip variation

    - Fully automated AFM solution for defect imaging and analysis

    - A fully automated system with auto tip exchange, robot wafer handler

    - Capable of scanning 300 mm wafers

  • Park NX-Mask
    An AFM-based EUV Mask Repair and More...

    • Park NX-Mask is the new generation photomask repair system that addresses the latest challenges of shrinking device geometries and increasing photomask complexities. Park NX-Mask is an innovative tool for the repair of high-end EUV Mask incorporating advanced atomic force microscopy technology.
    It provides all in one solution from auto defect review to repair of defects to verification of the repair, accelerating the throughput at unprecedented repair efficacy.

    - No risk of damage and seamless repair of any type of defects

    - Compatible with a dual pod for handling EUV masks

    - All-in-one solution for locating defects and post-repair verification

  • Park NX-Hybrid WLI
    The fully automated industrial WLI-AFM system...

    • Park NX-Hybrid WLI is the first-ever AFM with built-in WLI profilometry for semiconductor and related manufacturing quality assurance, process control for semiconductor front-end, back-end up to advanced packaging, and R&D metrology. It is for those that require high throughput measurements over a large area that can zoom down to nanometer-scale regions with sub-nano resolution and ultra-high accuracy.

  • Park NX-TSH
    The automated Atomic Force Microscopy (AFM) system for ultra large and heavy flat panel displays at nanoscale...

    • As the demand for Atomic Force Metrology for larger flat panel displays increases, Park NX-Tip Scan Head overcomes nanometrology challenges for samples over 300mm. The Tip Scanning Head and gantry style air-bearing stage allows Park NX-TSH to accurately image roughness measurement, step height measurement, critical dimension measurement.
    Atomic force microscopy is the most accurate, and non-destructive, method of measuring samples at nanoscale and with Park NX-TSH, reliable, high resolution AFM images can be obtained on OLEDs, LCDs, photomasks and more.

  • Park FX40
    A New Class of Atomic Force Microscope: The Automatic AFM...

    • Effortlessly, get the sharpest, clearest, highest resolution images and measurements one sample after another on various applications. Boost your progress and scientific discoveries through unprecedented speed and accuracy – as the Park FX40 autonomously images and acquires data powered by its artificial intelligence, robotics and machine learning capability. The Additional axis cameras automatically align with laser beams and photodetectors. The early warning systems and fail-safes at every step of the way allow you to focus on your research and not the tool.

Categories

203 Equipment, Inspection & Measurement
  • Microscopes: Atomic Force Microscopes (AFM)
    • 205 Equipment, Nanotechnology
  • Equipment, Nanotechnology Tools
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