The Octiv Suite has the equivalent performance to network analyzer and oscilloscope combined, in-line at high power. It has advanced endpoint capabilities using plasma impedance and harmonic spectrum analysis, which can detect etch endpoints (< 1% open area) with higher sensitivity than multivariate OES endpoint detectors. Live output of ion flux, plasma density and electron temperature is possible. The sensor has <0.1% run-to-run variability, enabling chamber and process matchingfor significant cost benefits through fault detection and early intervention.