HAMAMATSU PHOTONICS KOREA CO., LTD.

The Optical NanoGauge series is a non-contact film thickness measurement system utilizing spectral interferometry.

Our systems are capable of high-precision spectroscopic measurement, which enables to measure accurate reflection spectra. Analysis of the reflection spectrum enables various film thickness measurements from the nanometer order to the micrometer order. It also calculates optical constants with high accuracy.

Monitoring Plasma (Emission Spectrum) in Real-Time

C10346-01 is a monitoring system to detect wide spectrum plasma emission during the process of etching, spattering and CVD in semiconductor manufacturing. With the various analysis functions, it can be used for setting up end-point detection conditions and automatic detection of etching and cleaning, estimation of plasma species and monitoring (plasma) contamination and abnormal discharges.

You can analyze and localize failure points on your wafers or die samples by using a parameter analyzer/LSI tester, and to run test programs for both static and dynamic analysis. Our new laser scanner, high accuracy stage and new software bring you to next advanced level of fault localization.

The PHEMOS-X is a high-resolution emission microscope that pinpoints failure locations in semiconductor devices by detecting the weak light emissions and heat emissions caused by defects. Various applications and combinations lead you to next fault localization stage.

The Dual PHEMOS-X is designed for advanced, 3D, nontransparent devices where simultaneous optical FA is required from both front and back on the wafer or die level.