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HAMAMATSU PHOTONICS KOREA CO., LTD.

  • Booth: D222

Technologies for analysis & process monitoring.

Overview

Hamamatsu Photonics K.K. is a leading company to advance photonics technologies. We are handling photomultiplier tubes, imaging tubes, opto-semiconductors, and imaging and analyzing systems in Japan, North America, Europe, and Asia. 

In the SEMICON KOREA 2025, we are pleased to introduce Quantitative Phase Microscopy (QPM) optical module.


  Press Releases

  • Hamamatsu Photonics K.K. is a leading company to advance photonics technologies. We are handling photomultiplier tubes, imaging tubes, opto-semiconductors, and imaging and analyzing systems in Japan, North America, Europe, and Asia. 

    In the SEMICON KOREA 2025, we are pleased to introduce Quantitative Phase Microscopy (QPM) optical module.

    Our prime products in SEMICON KOREA2025 are Quantitative Phase Microscopy (QPM) optical module.

    QPM is an interference microscope module capable of detecting nanometer-scale

    defects. By integrating our QPM module, customers can create their own high-precision interference microscopes. In addition to our current QPM product which images surface structures, we are now developing a new QPM product line that can image the internal structures of semiconductor devices. These development models include a visible wavelength type specialized for SiC/GaN/Glass and an SWIR wavelength type specialized for Si/GaAs.


  Products

  • Quantitative Phase Microscopy (QPM) optical module
    QPM is an interference microscope module capable of detecting nanometer-scale defects. ...

  • By integrating our QPM module, customers can create their own high-precision interference microscopes. In addition to our current QPM product which images surface structures, we are now developing a new QPM product line that can image the internal structures of semiconductor devices. These development models include a visible wavelength type specialized for SiC/GaN/Glass and an SWIR wavelength type specialized for Si/GaAs.

  • Optical NanoGauge Thickness measurement system
    C15151-01 for super thin film measurement....

  • The Optical NanoGauge series is a non-contact film thickness measurement system utilizing spectral interferometry. Our systems are capable of high-precision spectroscopic measurement, which enables to measure accurate reflection spectra. Analysis of the reflection spectrum enables various film thickness measurements from the nanometer order to the micrometer order. It also calculates optical constants with high accuracy.

  • PHEMOS-X
    High-Resolution Emission microscope...

  • The PHEMOS-X is a high-resolution emission microscope that pinpoints failure locations in semiconductor devices by detecting the weak light emissions and heat emissions caused by defects. Various applications and combinations lead you to next fault localization stage.
  • Dual PHEMOS-X
    The ULTIMATE COMBO SYSTEM Dual side Failure Analysis for 3D devices...

  • The Dual PHEMOS-X is designed for advanced, 3D, nontransparent devices where simultaneous optical FA is required from both front and back on the wafer or die level.

  • iPHEMOS-MPX
    Inverted Photo Emission microscope...

  • You can analyze and localize failure points on your wafers or die samples by using a parameter analyzer/LSI tester, and to run test programs for both static and dynamic analysis. Our new laser scanner, high accuracy stage and new software bring you to next advanced level of fault localization.