Park Systems Corp.

Suwon,  Korea (South)
http://www.parksystems.com
  • Booth: C836

Enabling Nanoscale Advances, Park Systems

Overview

Park Systems Corporation is the industry leader in manufacturing nanoscale microscopy and metrology solutions. Its comprehensive range of products includes atomic force microscopy (AFM), white light interferometry (WLI), nanoinfrared spectroscopy (NanoIR), and imaging spectroscopic ellipsometry (ISE) systems. The company’s commitment to excellence has resulted in the development of several groundbreaking innovations, including True Non-Contact Imaging, 3D metrology, and fully automated AFM systems that are able to cater to both research and industrial needs.
Park Systems products offer extensive application potential within the fields of scientific research, nanoscale engineering, semiconductor fabrication, and quality assurance. The company’s ongoing dedication has earned Park Systems the status of the most preferred choice for nano-metrology products among the leading semiconductor companies, renowned scientific research universities, and national labs.


  Products

  • Park FX40
    A New Class of Atomic Force Microscope: The Automatic AFM...

  • Park FX40 transforms atomic force microscopy, placing user benefits at the forefront through groundbreaking autonomy and advanced technology. Integrated intelligence and robotics automate set up and scanning tasks, freeing researchers from manual operations. This includes managing probes, alignment, sample positioning, and imaging optimization, allowing users to focus on their specialized work. With improved electromechanics, noise reduction, and multi-sample imaging, the FX40 streamlines data collection, research workflows, and data publication, empowering accelerated scientific progress and discovery.
  • Park FX200
    The most advanced AFM for 200 mm samples...

  • Introducing Park FX200, Park Systems' latest innovation in Atomic Force Microscopy tailored for 200 mm samples. Boasting an advanced mechanical structure that ensures a significantly lower noise floor, minimal thermal drift, and exceptional stability, the FX200 sets a new standard in precision and reliability. Its faster Z servo performance and improved high-power sample view enhance operational efficiency and imaging capabilities, while features like automatic probe recognition and probe exchange, laser beam alignment, and macro optics for full sample view simplify user experience and maximize productivity. With optical autofocus, navigation, and sequential measurements at multiple coordinates, coupled with automated AFM scan parameter settings, automated data analysis, the FX200 streamlines complex operations, making it the ideal choice for both research and industrial applications. Delivering superior performance and ease of use, Park FX200 stands poised to revolutionize nanoscale imaging and analysis, empowering scientists and engineers to achieve unprecedented insights and advancements in their fields.
  • NX-Wafer
    Industry’s Leading Automated AFM for In-line Metrology Solutions...

  • Park Systems Automated AFMs are engineered to excel wafer fabrication metrology, offering a precise toolset for critical measurements and analysis tasks. These advanced systems facilitate the detailed metrology required in semiconductor wafer fabrication, providing consistent, accurate, and extensive data that supports improved manufacturing processes and product quality. Designed to integrate seamlessly with existing fabrication lines, they deliver a robust solution for semiconductor production engineering and quality assurance. Park NX-Wafer is the industry’s leading automated AFM metrology system for semiconductor and related fabrications. It provides wafer fab inspection and analysis, automatic defect review for bare wafers and substrates, and CMP profile measurements. Park NX-Wafer has the highest nanoscale surface resolution with sub-angstrom height accuracy, scan after scan with negligible tip to tip variation and preserved tip sharpness unmatched by others. Park NX-Wafer with its automated system features including auto tip exchanger, live monitoring, target positioning without reference marks and auto analysis makes the best semiconductor AFM tool in the industry.
  • NX-Hybrid WLI
    Bringing White Light Interferometry into AFM for Semiconductor Metrology...

  • In the semiconductor industry, device packaging is critical in playing a key role in determining the performance, size, and reliability of modern devices. As manufacturers strive to meet the demands for smaller, more powerful semiconductors, they face challenges such as intricate integration of components, efficient thermal management, material compatibility, and maintaining electrical integrity at higher frequencies. Park Atomic Force Microscopy solutions address these challenges head-on. With their advanced precision and capability to analyze nanoscale structures, Park AFM tools enable manufacturers to navigate the complexities of advanced device packaging.

    Park NX-Hybrid WLI is the first-ever AFM with built-in WLI profilometry for semiconductor and related manufacturing quality assurance, process control for semiconductor front-end, back-end up to advanced packaging, and R&D metrology. It is for those that require high throughput measurements over a large area that can zoom down to nanometer-scale regions with sub-nano resolution and ultra-high accuracy.

  • NX-Mask
    An AFM-based Mask Repair and More...

  • Park NX-Mask presents optimized solutions tailored for inline production, featuring an automated dual pod design specifically engineered for handling masks. Utilizing AFM technology, it ensures seamless repair of any defect type, offering an all-in-one solution encompassing automatic defect review, defect repair, and verification of the repair process. Moreover, its automated dual pod design streamlines the handling of masks in an inline production environment, enhancing efficiency and precision throughout the process.