MSP Turbo II™ Vaporizers are engineered using cutting-edge droplet atomization science and a Direct Liquid Injection (DLI) method to meet the evolving demands of modern vaporization applications.
With a compact design—just half the size of previous models—they deliver up to 200% more vapor output. This performance boost enables stable, uniform vapor delivery, leading to higher-quality thin films and improved wafer yields in semiconductor manufacturing. The clog-resistant design ensures precise control and allows the use of challenging precursors that were previously incompatible, unlocking new process possibilities. The result is extended, stable operation with reduced maintenance, less downtime, and significant cost savings for users.
MSP Turbo II™ Vaporizers set a new standard for reliable and efficient vapor delivery in advanced material processes.