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AXCELIS TECHNOLOGIES

Beverly,  MA 
United States
http://www.axcelis.com
  • Booth: D522

Accelerating Intelligent Solutions in Ion Implant

Overview

Axcelis has been providing innovative, high-productivity solutions for the semiconductor industry for over 45 years. Axcelis is dedicated to developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the most critical and enabling steps in the IC manufacturing process. 

At Axcelis, we have a single goal: to help semiconductor manufacturers achieve the highest quality and yield, with the lowest cost of ownership. We deliver on that goal with ion implant platforms based on unique enabling technologies that provide unmatched purity, precision and productivity. The result: competitive advantage for our customers—and rapid growth for Axcelis.

At Axcelis, we understand that different semiconductor applications pose their own unique ion implantation challenges. We combine industry-leading technical expertise in fab process optimization with the most advanced ion implant technologies to deliver practical solutions tailored to the specialized needs of distinct market segments, including power devices, image sensors, mature process technology, memory and logic devices.

  Press Releases

  • BEVERLY, Mass., Feb. 4, 2026 /PRNewswire/ -- Axcelis Technologies, Inc. (NASDAQ: ACLS), a leading supplier of enabling ion implantation solutions for the semiconductor industry, today introduced the Purion H6™ high current ion implanter—engineered to meet the demands of next-generation semiconductor devices with unmatched purity, precision and productivity.

    The Purion H6 builds on the success of the well-established Purion H product line, integrating new technologies to support today's most advanced device manufacturing. This next generation system combines a high throughput beamline with innovations in source life, particle control, and dosimetry. These enhancements deliver the highest quality beam while driving ease of use, low cost of ownership, and overall system reliability. The Purion H6 provides customers with a single solution designed specifically to meet these challenges across the full spectrum of existing and emerging high current applications in logic, advanced memory, image sensor and mature technology market segments.

    Purion H6 High Current Implanter Advantages:

    • Next Generation Dose Control – Provides superior repeatability, wafer safety and cost of operation. 
    • Enhanced Particle Control – Optimized beam line design reduces contamination, improving yield while reducing preventative maintenance frequency and cost.
    • Eterna™ ELS7 Source Technology – Delivers improved beam stability and repeatability, reduced preventative maintenance time and complexity, and extended source life. 
    • Best in Class Productivity – Delivers the highest beam currents in its class, enabling industry leading throughput.

    President and CEO, Dr. Russell Low, commented, "We're excited to launch the new Purion H6 next generation high current ion implanter, designed to support our customers' most advanced semiconductor device manufacturing challenges. Axcelis is focused on innovative implant solutions that drive the process performance and Cost of Ownership required to enable major device inflections in logic, advanced memory, image sensor and mature technology market segments.

    Executive Vice President, Dr. Greg Redinbo, noted, "Designed in close collaboration with our customers, we've created a platform that sets new benchmarks in implant purity, precision and productivity. The new system introduces an innovative new dose control technology and enhanced beamline optimization — achieving exceptional implant process control while delivering best-in-class productivity, and capital efficiency."

    More information on the Purion H6, including a product video, can be found on the Axcelis website.

    The new system, along with other ion implant innovations for making next generation semiconductor devices, will be on display at the Axcelis booth #D522 at SEMICON Korea, at COEX in Seoul, South Korea from Feb. 11-13.

    About Axcelis:
    Axcelis (Nasdaq: ACLS), headquartered in Beverly, Mass., has been providing innovative, high-productivity solutions for the semiconductor industry for over 45 years. Axcelis is dedicated to developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the most critical and enabling steps in the IC manufacturing process. Learn more about Axcelis at www.axcelis.com.

    Safe Harbor Statement
    Statements made in this press release that are not of known historical fact are forward-looking statements and are subject to the safe harbor provisions created by the Private Securities Litigation Reform Act of 1995. These statements, which include statements regarding our products, are based on management's current expectations and should be viewed with caution. They are subject to various risks and uncertainties that could cause actual results to differ materially from those in the forward-looking statements, including the risks and uncertainties that are described in the documents filed or furnished by us with the Securities and Exchange Commission, including specifically the risk factors described in our Annual Reports on Form 10-K and Quarterly Reports on Form 10-Q. The Company undertakes no obligation to update the information or statements made in this press release.

    CONTACTS:

    Press/Media Relations Contact: 
    Maureen Hart
    Senior Director, Corporate & Marketing Communications
    Telephone: (978) 787-4266
    Email: [email protected]

    Investor Relations Contact:
    David Ryzhik
    Senior Vice President, Investor Relations and Corporate Strategy
    Telephone: (978) 787-2352
    Email: [email protected]

    Cision View original content to download multimedia:https://www.prnewswire.com/news-releases/axcelis-unveils-purion-h6-next-generation-high-current-ion-implanter-for-advanced-semiconductor-manufacturing-302678762.html

    SOURCE Axcelis Technologies, Inc.

  • Highlighting New Technologies That Advance Intelligent Semiconductor Manufacturing Solutions

    BEVERLY, Mass., Feb. 4, 2026 /PRNewswire/ -- Axcelis Technologies, Inc. (Nasdaq: ACLS), a leading supplier of enabling ion implantation solutions for the semiconductor industry, announced today that it will showcase its innovative Purion™ platform of ion implanters at SEMICON Korea 2026. The event will take place February 11–13 at the COEX Center in Seoul, South Korea. SEMICON Korea will feature key technology developments shaping the next generation of semiconductor manufacturing, including AI driven process control, advanced packaging methodologies, and sustainable, high efficiency fab operations.

    Axcelis will be located at Booth #D522. Semiconductor manufacturers are invited to visit the Axcelis exhibit to learn first-hand about the latest products and upgrades that accelerate intelligent solutions in ion implant and deliver significant technology and manufacturing advantages.

    Event highlights:

    • Introducing the Purion H6™: Axcelis' next generation Purion H6 high current implanter engineered to meet the demands of next-generation semiconductor devices with unmatched purity, precision and productivity.
    • SEMI Technology Symposium (STS) Presentation: Applications of Ion Implantation Technology for Scaling Down Advanced Devices will be presented by Dr. KyungWon Lee, Applications Staff Scientist.
      When: February 11th - 03:15 pm - 03:40 pm
      Location: Conference Room #308, (South), 3F, COEX

    President and CEO of Axcelis Technologies, Russell Low, said, "Axcelis is pleased to participate in SEMICON Korea, one of the industry's leading technology forums. Korea remains a strategic market for our company, and our expanding installed base and support infrastructure underscores our commitment to customer success. We look forward to highlighting our latest innovations, including the next generation Purion H6 high current implanter, which is engineered to meet the most advanced process requirements across the full spectrum of high current applications in all market segments."

    About Axcelis:
    Axcelis (Nasdaq: ACLS), headquartered in Beverly, Mass., has been providing innovative, high-productivity solutions for the semiconductor industry for over 45 years. Axcelis is dedicated to developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the most critical and enabling steps in the IC manufacturing process. Learn more about Axcelis at www.axcelis.com.

    CONTACTS:
    Press/Media Relations Contact:     
    Maureen Hart
    Senior Director, Corporate & Marketing Communications
    Telephone: (978) 787-4266
    Email: [email protected]

    Axcelis Investor Relations Contact:
    David Ryzhik
    Senior Vice President, Investor Relations and Corporate Strategy
    Telephone: (978) 787-2352
    Email: [email protected]

    Cision View original content to download multimedia:https://www.prnewswire.com/news-releases/axcelis-announces-participation-in-semicon-korea-2026-302678414.html

    SOURCE Axcelis Technologies, Inc.

  Products

  • Purion Power Series+
    World Leader in Ion Implant Solutions for the Power Device Market...

    • The power device market is one of the fastest growing segments in IC manufacturing, due in part to the robust growth in the e-mobility and renewable energy markets. Axcelis is the only implant supplier in the industry to offer a comprehensive solution to our power device manufacturing customers. The Purion Power Series+TM family is uniquely suited to excel at these applications due to its innovative platform that offers the flexibility to handle multiple wafer sizes (150mm, 200mm and 300mm), various substrate types (including SiC, Si, GaN, and GaAs wafers) and at various implant temperatures (room temperature, warm and hot). This is all accomplished while delivering the industry’s highest throughput and capital efficiency. The Purion Power Series+ covers the full ion implant market space with the Purion H Purion Power Series for high current applications, the Purion H200+ Power Series for high current medium energy applications, Purion M+ Power Series for medium current applications and the Purion XE Power Series for high energy applications.
  • Purion H Series high current ion implanters
    Purion H ion implanters bring the industry-leading process control of our medium current platforms to the full range of demanding, high-current applications...

    • Purion H ion implanters bring the industry-leading process control of our medium current platforms to the full range of demanding, high-current applications. The flexibility of the platform enables us to tailor Purion H to the specific energy or dosing requirements of your application. The Purion H offers unmatched versatility, throughput and uniformity, so you can achieve greater yield with the lowest cost of ownership.

    Purity

    Unique scanned-spot-beam architecture with the Purion Contamination Shield™. The Purion High Current Platform features a five-filter beamline design including a field proven energy filter for extreme purity. Each system includes the patented, filament-free microwave Plasma Electron Flood (PEF) to enable wafer neutralization without additional metals contamination.

    Precision

    Purion Vector™ dose and angle control system ensures highly precise, uniform dopant placement across the entire wafer by precise measurement and control of both horizontal and vertical angles. The scanned spot beam architecture enables a unique damage engineering knob to tailor the implant profile to optimize device performance.

    Productivity

    IdealScan™ is an Axcelis patented technique to scan the spot beam to maximize the use of the spot beam for highest beam current in the region of interest.  The combination of high beam current and the Purion 500 wph end station makes Purion High Current tools the highest in productivity.

  • Purion H200 Series ion implanters
    The Purion H200 is our state-of-the-art single wafer high current medium energy implanter and the only true high current medium energy tool on the market...

    • The Purion H200 is our state-of-the-art single wafer high current medium energy implanter and the only true high current medium energy tool on the market. It has the industry’s widest energy range, from 10keV to 230keV. The Purion H200 combines high current power with medium current precision using advanced beamline technology from Purion H and high energy capabilities from Purion M.

    Purity

    Designed with Axcelis’ hybrid filtration architecture to filter metals, the proprietary angular energy filter design to filter energy contamination and increased pumping to mitigate photoresist outgassing effects.

    Precision

    The Purion H200 comes with the Vector Dose and Angle Control System that delivers beams with angular precision and unique constant focal length scanning to enable the same dose rate on the top and bottom of the substrates even at high tilt.

    Productivity

    Unmatched productivity in the medium energy space which is enabled via the combination of a high current beamline with the medium current acceleration column and terminal design.

  • Purion XE Series high energy ion implanters
    Our Purion XE series of ion implanters have rapidly earned a reputation as the industry standard for today’s demanding high energy recipes...

    • Our Purion XE series of ion implanters have rapidly earned a reputation as the industry standard for today’s demanding high energy recipes. Their unique RF Linear Accelerator (LINAC) technology offers higher reliability, a wider energy range and greater productivity than competing platforms, with superior metals contamination control.

    Purity

    The multi-filtration technology in our RF LINAC-based beamline filters out impurities other designs miss, achieving the industry’s lowest levels of metals and particulates contamination.

    Precision

    Proprietary VectorTM control system uniquely provides in-situ horizontal and vertical measurement and correction, enabling zero-degree implants.

    Productivity

    Achieve throughput of up to 500 WPH, thanks to our high-speed Purion End Station and our RF LINAC-based beamline, offering the industry’s highest beam currents over the broadest energy range—from 40keV to 15MeV.

  • GSD Ovation high current and high energy batch
    The GSD platform is the industry benchmark for the longest manufactured and supported batch ion implanter...

    • Batch Implanters For mature process technology applications, semiconductor manufacturers can rely on Axcelis to provide a full range of 150 to 200mm substrate products designed to add process capabilities and boost your manufacturing capacity. The Axcelis GSD™ Series platform is the industry benchmark for batch implanter productivity. The Ovation™ is the latest configuration designed to seamlessly integrate into your existing Axcelis batch implanters. The Ovation™ extends the GSD series into the future while delivering the highest reliability, serviceability, and lowest cost of operations.

    • GSD/E2™ Ovation High current productivity plus superior process control in a proven, reliable package makes the GSD/E2 Ovation the consistent choice of mature process technology fabs.

    • GSD Ovation ES Best in class high current Hydrogen & Helium implant capability for wafer splitting and engineered substrate applications.

    • GSD/HE™ Ovation The industry leading batch high energy system is designed to maximize throughput and process flexibility with energy ranges of up to 3 MeV, which allows for all retrograde wells and channel implants to be performed in a chain. The system leverages the GSD batch handling technology combined with unmatched beam purity derived from the LINAC.

    • GSD/VHE™ Ovation With an energy range of up to 4.9 MeV, the GSD/VHE Ovation delivers the highest energy implants. For advanced IC formation requiring deep twin or triple wells and buried layer structures, the system offers proven solutions. 

Categories

207 Equipment, Process
  • Ion Implantation Equipment
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