If you are using any of silicon wafer or GaAs, glass, and/or semiconductor substrates; you must be measuring the film thickness for uniformity. Including PR, oxide film, and/or nitride film. Our systems use the specified optical lens including a spectrometer and the image sensor to measure the reflective light or interference spectrum from the substrate of your product.
We recommend using CXsemi’s FilmChek system. If you need specifications, please contact us. We are happy to provide the information for you.