CRESTEC CORPORATION

Hachioji-shi,  Tokyo 
Japan
http://www.crestec8.co.jp
  • Booth: N913


Welcome to Crestec Booth!

We can provide value and satisfaction to customers, based on Electron Beam Lithography technology.
Crestec Corporation has established in Tokyo 1995. We delivered EB Lithography System to all over the world. We provide EB foundry service too. We can make fine controlled pitch L/S patterns for DFB-LD. CABL-9000C model is the best seller in DFB-LD market.
CABL-UH（130kV）series provides less forwardscatter of EB resist due to higher acceleration voltage and its accuracy is less than 10nm.
CABL-AP（50kV）series is the best model for production of DFB-Laser diode for optical communication devices and for Academic and R&D. It provides high resolution and high throughput with 50kV.

 Products

  • CABL-UH (130 kV) SERIES
    There is less forwardscatter of EB resist due to higher acceleration voltage.
    CABL-UH model has more accuracy less than 10nm....

    • There is less forwardscatter of EB resist due to higher acceleration voltage. CABL-UH model has more accuracy less than 10nm. You can select 90kV, 110kV or 130kV depending on your budget.

    Beam diameter: <1.6 nmΦ
    Acceleration Voltage: 130 kV, 110 kV or 90 kV
    Stage Size: 8 inch wafer (you can use any other wafers less than 8 inch wafer)

  • CABL-AP (50 kV) SERIES
    It is the best model for production of DFB-Laser diode for optical communication devices and for Academic and R&D as well. We realize high resolution and high throughput with 50kV....

    • It is the best model for production of DFB-Laser diode for optical communication devices and for Academic and R&D as well. We realize high resolution and high throughput with 50kV.
    Beam diameter: < 2 nmΦ  (for Academic and R&D) 
                             < 4 nmΦ  (for Production)  
    Accerelation voltage: 50kV, 30kV
    Stage size: 4 inch, 6 inch ,8 inch wafer model

Categories

207 Equipment, Process
  • Lithography; Exposure - Aligners; Direct Write Systems; Steppers; Scanners; Nanoimprint
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