ZEISS

Petaling Jaya,  Selangor Darul Ehsan 
Malaysia
http://www.zeiss.com.sg/microscopy
  • Booth: A516


Paving the way for your next-generation devices.

ZEISS

ZEISS has the most comprehensive portfolio of light, X-ray, electron beam and ion beam imaging technologies in the industry and is a leading solution provider to the global semiconductor community. Solutions span semiconductor manufacturing from wafer fab through packaging and assembly. For mask making and lithography, ZEISS provides unique solutions in the areas of zero defect, in-die metrology, critical dimension/registration and overlay control. ZEISS innovative process control and failure analysis solutions deliver actionable information to both wafer fab and packaging/assembly processes to meet the semiconductor industry’s challenges for next-generation devices.

ZEISS is represented in over 40 countries around the globe with more than 40 manufacturing sites, around 50 sales and service locations, and over 20 research and development centers. Founded in 1846 in Jena, the company now has its headquarters in Oberkochen in southwest Germany. Carl Zeiss AG is wholly owned by the Carl Zeiss Stiftung (Carl Zeiss Foundation).


 Products

  • ZEISS Smartproof 5
    Your Integrated Widefield Confocal Microscope for Surface Analysis in Quality Assurance and Quality Control...

  • ZEISS Smartproof 5

    Your Integrated Widefield Confocal Microscope for Surface Analysis in Quality Assurance and Quality Control

    The versatile ZEISS Smartproof 5 widefield confocal microscope is your integrated system for surface analysis: fast, precise and repeatable. Put it to work on a wide range of industrial applications - such as roughness and topographical characterization - that come up every day in QA/QC departments, production environments and R&D labs.

    This high quality confocal system is driven by the powerful software ZEISS Efficient Navigation (ZEN) to bring you the added benefits of maximum user comfort and increased productivity.

  • ZEISS Axio Imager Vario
    Examine large specimens with automated processes – compatible with clean rooms...

  • ZEISS Axio Imager Vario

    Examine large specimens with automated processes – compatible with clean rooms

    Examine tiny MEMS sensors, XXL wafers and everything in between. With a maximum specimen size of 300×300 mm and an impressive maximum specimen thickness of 254 mm, this is the non-destructive way to analyze large specimens. The column design ensures stability.

    Examine wafers in your clean room: Axio Imager Vario is DIN EN ISO 14644-1-certified and meets the requirements of clean room class ISO 5. With the motorized Z-axis drive and the Autofocus system, you can bring low contrast, reflective specimens into perfect focus. This produces optimum results every time.

  • ZEISS Xradia 620 Versa
    3D X-ray Microscopy for Faster Sub-Micron Imaging of Intact Samples...

  • ZEISS Xradia 620 Versa

    3D X-ray Microscopy for Faster Sub-Micron Imaging of Intact Samples

    ZEISS Xradia Versa 3D X-ray microscopes (XRM) are the benchmark in non-destructive failure analysis and product verification for semiconductor packages with buried features, including:
    • 2.5D interposers
    • High bandwidth memory and VNAND
    • Stacked chips with TSVs
    • All types of flip chip and microbump interconnections
    • Wafer-level packages and packageon- packages

    High-resolution Non-destructive 3D X-ray Imaging
    • Capture high-resolution cross-section images and tomographies of fault locations and buried features without cutting the samples
    • View images from any orientation, in their native state, using interactive virtual cross-sections
    • Obtain unsurpassed performance for high-resolution imaging at long working distances in packages, circuit boards and 300 mm wafers

    Versatile for all Package Types
    • Reduces the need for traditional failure analysis such as cross-sectioning
    • Increases the success rate of physical cross-sections, when needed, by more precisely identifying defect locations
    • Enables measurement of buried structures within the imaged volume from any optimal plane
    • Reveals submicron structural changes within samples during multiple reliability test cycles and read-points, while leaving the samples intact

    Versatile for all Package Types
    • Reduces the need for traditional failure analysis such as cross-sectioning
    • Increases the success rate of physical cross-sections, when needed, by more precisely identifying defect locations
    • Enables measurement of buried structures within the imaged volume from any optimal plane
    • Reveals submicron structural changes within samples during multiple reliability test cycles and read-points, while leaving the samples intact

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