Atmospheric Processes
- Diffusion (drive-in) high temperature procesess
- Doping from solid, liquid and gaseous dopant sources e.g.: BBr3, B2H6, POCL3, PH3, BN
- Various thermal processing e.g. annealing, sintering
- Pyrogenic Wet Oxide with External Burning System
- Wet Oxide with ultra pure steamer
- Dry Oxide
- HiPOx (High Pressure Oxide)
LPCVD Processes
- Silicon nitride
- Low temperature oxide (LTO)
- High temperature oxide (HTO)
- TEOS oxide
- Polysilicon, with tilt/flat temperature profile
- Doped polysilicon
- Oxynitride
PECVD Processes
- Silicon nitride (incl. anti-reflective SiN solar cell coating)
- Silicon oxide
- Oxinitride
DCE or HCl optional for all processes