TECHNIC

TechniStrip® NF52 is formulated to provide powerful stripping performance on difficult to remove dryfilm photoresist and is the product of choice for many leading semiconductor manufacturers.

Features

• Dissolution on most commercial dryfilm photoresist • Dissolution of commercial spin-on photoresist (N & P Tones)
• Extremely low etch rate on Cu, Ni, Au and other materials • Compatible with fragile III/V materials and organic substrates
• High stripping rate of > 10 µm/minute
• Long bath life
• Proven performance on both batch (spray and immersion) and single-wafer toolsets

Benefits

• Reduced cost of operation achieved through a highly efficient process and longer bath life
• Reduced defects by providing full dissolution on most dryfilm and liquid photoresist
• High metal compatibility provides wider processing window and ease of operation
• CMR free (carcinogenic, mutagenic or toxic for reproduction) formulation reduces safety risk to operators

Technic’s Real Time Analyzer 3D version is the culmination of many years of field and lab experience by the RTA team. This system utilizes all the technology found in the well-established RTA system with additional features to increase reliability and robustness. The Technic RTA is the only commercially available automatic instrument that utilizes a combination of modern electrochemical techniques (Cyclic Voltammetry including) with state-of-the-art statistical (chemometric) approach.

Features and Benefits

• State-of-the-art of electronic components

• Innovative electrochemical techniques

• Intuitive Graphical User Interface

• Design based on field experience and customer input

• Virtually consumable free

• Automatic temperature correction capabilities

• Open software architecture allowing advanced for customization and integration