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ECM Greentech

Grenoble,  France
https://ecm-greentech.fr/
  • Booth: 1819

Your SEMI Partner with Equipment + Process Expertise

Overview

ECM Greentech SEMCO is present in the semiconductor market since 1986 and has extensive experience in engineering and manufacturing of mass-production and labortory furnaces for atmospheric and reduced-pressure processing as well as wafer transport automation and software control. 

The company's field of competence covers diffusion, oxidation, LPCVD and PECVD. Typiocal applications include LYDOP POCL3 and BCl3 Diffusion, LYTOX Wet and Dry Oxidation, Anneal, Silicon Nitride, Silicon Oxinitride, Poly Silicon and TEOS. To address the challenges attached to scaling from lab scale R&D to pilot line and volume manufacturing, SEMCO ECM proposes the MINILAB platform, an offsite  process development and qualification tool covering the complete range of above-named applications. 

SEMCO's Electrostatic Chucks offers smart solutions for clamping and processing of thin and ultra-thin wafers based on its proprietary ESC capacitive technology. SEMCO has been designing and manufacturing electrostatic chucks (ESC) and heating pedestals to the wafer processing industry since 1992. SEMCO ECM provides leading OEMs, Semiconductor Fabs, foundries and laboratories worldwide with innovative and efficient wafer handling components as original equipment or retrofit. The company actively manages global support through our subsidiaries and service centers.

ECM SEMCO also specialized in the design and manufacture of mass flow controllers, precision valves and assemblies for the control of liquids and gases used in the fabrication of semiconductor, optical and PV materials.


  Products

  • DF SERIES
    BATCH TYPE HORIZONTAL TUBE FURNACE
    ...

  • MASS PRODUCTION

    Furnace up to 200mm Wafers

    • Batch-type production furnace
    • Diffusion, LPCVD, Oxidation LYDOPTM
    • Up to 4 independent tubes
    • 50-400 wafers per tube
    • Best in-class uniformity
    • Automatic loading
  • TUBESTAR
    SEMICONDUCTOR BATCH TYPE HORIZONTAL TUBE FURNACE
    ...

  • R&D / PILOT PRODUCTION HORIZONTAL

    Furnace up to 200mm Wafers

    • Batch-type tube furnace
    • Diffusion, LPCVD, Oxidation LYDOPTM
    • 1-4 independent tubes
    • Up to 100 wafers per tube
    • Ideal for process engineering
    • Small footprint
    • Manual or automatic loading
  • MEMSLAB
    BATCH TYPE VERTICAL FURNACE
    ...

  • R&D / PILOT PRODUCTION PECVD

    Platform up to 200mm Wafers

    • Batch-type PECVD furnace
    • Direct plasma, low RF
    • Pin mark free, excellent uniformity
    • Horizontal wafer process
    • Up to 25 wafers per batch
    • Multiple layer deposition possible
    • In-situ cleaning
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