Jiangsu VPTek Semiconductor AOI Equipment Co., Ltd.

Key features:

Compatible with 4, 6, 8 inch wafer, flexible and convenient

Double port circulation feeding and unloading, reduce operator waiting time

Dual optical path line array + area array imaging system, fast scanning

Support bright field + dark field lighting mode

Multiple focus modes are fitted based on hardware, software

Support multi-ROI and multi-layer partition inspection

Support D2D, D2G, and D2DB inspection mechanisms

Support AI defect identification and defect classification

Key features:

Compatible with 4, 6, 8 inch Wafer, flexible and convenient

Double port circulation feeding and unloading, reduce operator waiting time

Support manual measurement and recipe based automatic measurement

Support white, RGB and other wavelength lighting sources

Support a variety of edge extraction algorithms

Key features:

Ultra-high resolution optical system, high NA value UV lens, multi-zoom tube, UV laser lighting 

Support Die2DB/SL/Die2Die inspection mode

Support SMIF pod automatic box opening and automatic loading and unloading

High precision air float platform and piezoelectric Z axis are adopted to ensure fast and stable scanning of high-magnification lens 

Support simultaneous inspection of reflected light and transmitted light

Support OPC calibration

Support GPU distributed computing

Key features:

Support a maximum size of 8.5 generation TFT masks

Support automatic loading and unloading, and interconnecting with AGV

Support vertical and horizontal configuration

Support double optical head scanning greatly improves inspection efficiency

Support simultaneous inspection of reflected light and transmitted light, can inspect pinholes, particles and scratches

Support Die2DB, Die2Die inspection mode

Key features:

Inspect quartz and pellicle surface particle simultaneously

Compatible with RSP200, Nikon case, crystal box, automatic opening&loading

Inspection based on dark field

Real-time focusing technology based on hardware

Air bath wind knife is equipped to clear the surface particles of the mask glass

The interior of the machine meets ISO Class 2 cleanliness standards