RENA TECHNOLOGIES GMBH

For multi-step semiconductor wet chemical processes, RENA offers flexible and compact semi-automated wet bench, the “Revolution”. This platform consists of a robust integrated central rotary robot and up to 5 process tanks located around the robot. The “Revolution” is the most ideal, minimal foot print and low cost solution for applications that require multi-step sequence of processes. It provides surface treatment of semiconductor wafers including etching, cleaning and resist stripping, both in FEoL and BEoL applications.

The “Revolution” delivers superior process control and monitoring achieved by employing IDX Flexware software. The IDX Flexware offers advantageous features and capabilities. Based on the customer requirements, specialized process tank configurations e.g. patented metal etching and metal lift-off tanks, can be incorporated into this chemical station. For dry-to-dry processes, the patented Genesis Marangoni dryers can be integrated.

All RENA systems are maintenance friendly and compliant to the SECS/GEM interface of factory host.

For high throughput wet processing of semiconductor wafers, RENA offers the “Evolution”, a fully automated linear wet bench. Multiple surface treatment processes such as cleaning, etching, resist striping and drying can be performed using the “Evolution”. This chemical station has flexible modular design with robust transfer robot and can be customized according to your specific process sequences. The “Evolution” enables the batch processing of simultaneous wafer lots as well as dry-to-dry processing.

High production yield, low cost of operation and outstanding process control are the main features of this platform. This superior process control is achieved through IDX Flexware software, one of the most advanced in the semiconductor industry with unique features and capabilities. Specialized process tanks such as TruEtch, FluidJet and SiEtch and Ultrasonic and Megasonic tanks as well as patented Genesis Marangoni dryer can be integrated in “Evolution” to meet the customers process specifications.

All RENA systems are compliant to SECS/GEM interface of factory host.

Applications for solvent cleaning, resist strip and developing processes are performed highly efficiently including rinsing and drying. RENA spray batch system is designed for solvents. Different types of solvent can be combined in one chamber; this offers great potential for efficiency and process optimization. No direct contact to solvents by operator, this makes the process safe.

High flexibility and precise process control

The automatic wet processing systems for 150, 200 and 300 mm wafers support processing with and without carriers. They are engineered for precise process monitoring, high productivity and flexibility during production. The RENA Semi Processing Platform offers maximum production quality and throughput with the flexibility to be adjusted to  customer requirements. One of the platform highlights is a flexible carrierless handling system, which allows parallel processing of different wafer thicknesses.

Inception can be applied for acid applications in FEoL as well as solvent applications in BEoL. It provides superior etch uniformity <= 1% within wafer, from wafer to wafer and from lot to lot.

Inception consists of dual moving spray arms with separate chemical lines which together with multiple tank design provides multi-step processing features. A variation of chucks are available for different wafer and substrate sizes to allow easy setup for different applications. RENA’s IDX Flexware software provides many advantageous features for process control and monitoring. All RENA systems are compliant to the SECS/GEM interface of factory host.