Shanghai Jheat Technology Co., Ltd.

Overview 

Wafer wireless temperature measurement system captures the influence of etching process and environment on wafer, provides direct and real-time temperature measurement during every critical step in chip manufacturing. Armed with this comprehensive temperature data, technology engineers will be able to characterize and fine-tune process conditions to improve technology and equipment performance, wafer quality and yield. Wafer wireless temperature measurement system is used to monitor temperature changes in the production process of cutting-edge products.

Features

1. High accuracy, flexible application, fast measurement;

2. Scanning speed up to 10Hz, temperature accuracy up to 1mK;

3. Wireless communication, continuous working time not exceeding 60 minutes.

Parameters 

Overview

Wafer wired temperature measurement system is used to monitor temperature changes in the production process of cutting-edge products. It captures the influence of etching process and environment on wafer, provides direct and real-time temperature measurement during every critical step in chip manufacturing. 

Features

1. High accuracy, flexible application, fast measurement;

2. Scanning speed up to 10Hz, temperature accuracy up to 1mK;

3. Wired communication.

Parameters 

Overview

PCB-Wafer wireless temperature measurement system is used to monitor temperature changes in the production process of cutting-edge products.Armed with this comprehensive temperature data, technology engineers will be able to characterize and fine - tune process conditions to improve technology and equipment performance, wafer quality and yield.

Features

1. High accuracy, flexible application；

2. Scanning speed is 4Hz, temperature accuracy of 3mK;

3. Wireless communication, continuous working time not exceeding 60 minutes.

Parameter

Overview

Mask wireless temperature measurement system(PCB grade) is used to accurately measure the temperature distribution of photomasks. The processing and manufacturing process of semiconductor chips has very high requirements on the temperature uniformity of the surface of the photomask, which requires strict temperature measurement and control.

Features

1. Small size, high accuracy;

2. Temperature accuracy of 3mK;

3. Wireless communication,continuous working time of more than 100 minutes.

parameter

Overview

A mask, also known as a reticle, is a graphic master used in the photolithography in microelectronics manufacturing. It forms a mask pattern on a transparent substrate by an opaque light-shielding film, and transfers the pattern to the substrate by exposure. The processing and manufacturing process of semiconductor chips has very high requirements on the temperature uniformity of the surface of the photomask, which requires strict temperature measurement and control. Mask wireless temperature measurement system is used to accurately measure the temperature distribution of photomasks.

Features

a. Small size, high accuracy, high measurement speed;

b. Temperature accuracy up to 10mK;

c. Wireless communication, short response time, high measurement frequency, continuous working time of more than 100 minutes.

Parameters