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VERSYS SEMICONDUCTOR SOLUTIONS PTE LTD

West Park Bizcentral,,  Singapore 
Singapore
  • Booth: 4122

  Products

  • SILICON CARBIDE EPITAXIAL EQUIPMENT
    The equipment adopts the horizontal hot-wall technology route to achieve single-wafer epitaxial growth. The temperature field, flow field and other structures are stable, with lower consumable costs and maintenance frequency....

  • Being used in the core process of third-generation semiconductor silicon carbide chip production--Epitaxial Growth.The equipment process indicators are excellent, with industry-leading levels of thickness uniformity, concentration uniformity, defect density, and etc.

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