(1)Throughput: ≥1100 wafers/month, could reach≥1200wafers/month after optimization
(2)Epi spec: 6 inch (8 inch compatible)
(3)Temperature mode: multi zone controlling
(4)Flow mode: multi zone adjustable shower head
(5)Rotation speed: 0-1000RPH
(6)Maximum epi velocity: ≥60μm/h
(7)In-wafer thickness unif ormity:≤2% (could finetune to within 1%, δ/mean, EE 5mm)
(8)In-wafer concentration uniformity:≤3% (could fine-tune to within 2%, δ/mean, EE 5mm)