The atmospheric wafer transfer manipulator is designed for use in atmospheric cleanroom environments. It is composed of a main body, an arm, and an optional wafer fork. The manipulator transfers wafers through suction, clamping, and the cyclic movement of its joints. Its motions are categorized into vertical movement (Z-axis), rotational movement (T-axis), and arm extension/retraction (R/W-axis).
The five-axis semiconductor wafer handling robot featuring two independently controllable rotating arms. It supports EFEM wafer pick-up operations for systems ranging from 2 FOUPs to 3 FOUPs. The robot is characterized by high precision and high rigidity.