Fountyl Technologies PTE Ltd

Features:
High temperature resistance: Silicon carbide and alumina ceramic materials have excellent high temperature performance, can be used in high temperature environment for a long time, not easy to deformation or fracture.
Corrosion resistance: can withstand a variety of chemical corrosion, suitable for handling corrosive liquids or gases in the working environment.
Wear resistance: high hardness, with good wear resistance, can be used for a long time without failure.
Strong adsorption: the convex point structure reduces the contact area of the suction cup, thereby increasing the adsorption force per unit area, and can more firmly adsorb the workpiece.
High stability: Due to the characteristics of the material, the wafer pin chuck has high stability and can work stably for a long time.
Reduce pollution: Ceramic wafer chucks are evolving from grooves to pins to reduce contact area, reduce some pollution and improve warping correction.

Process control:
High precision: 12 inches diameter, flatness is controlled within 5 μm; If you need more precision, please email us.
Shape control: Adjust the chuck shape according to the wafer shape (non-uniformity control)
Absorptive responsiveness: Customized design according to specifications.

Applications:
Wafer fixation of semiconductor exposure device
Wafer fixation of wafer inspection device

Features:
High temperature resistance: Silicon carbide and alumina ceramic materials have excellent high temperature performance, can be used in high temperature environment for a long time, not easy to deformation or fracture.
Corrosion resistance: can withstand a variety of chemical corrosion, suitable for handling corrosive liquids or gases in the working environment.
Wear resistance: high hardness, with good wear resistance, can be used for a long time without failure.
Strong adsorption force: the groove structure reduces the contact area of the chuck, thereby increasing the adsorption force of unit area and enabling the workpiece to be adsorbed more firmly.
High stability: Due to the characteristics of the material, the chuck has high stability and can work stably for a long time.

Process control:
High precision: 12 inches diameter, flatness is controlled within 2 μm; If you need more precision, please email us.
Shape control: Adjust the chuck shape according to the wafer shape
Absorptive responsiveness: Customized design according to specifications

Applications:
Wafer fixation of semiconductor exposure device
Wafer fixation of wafer inspection device 

Porous ceramic vacuum chuck is also called nano microporous vacuum chuck, which means that a uniform solid or vacuum body is produced through a special nano powder manufacturing process, and a large number of connected or closed ceramic materials are generated inside the material through high temperature sintering. With its special structure, it has the advantages of high temperature resistance, wear resistance, chemical corrosion resistance, high mechanical strength, easy regeneration and excellent thermal shock resistance, which can be used for high temperature filtration materials, catalyst carriers, porous electrodes of fuel cells, sensitive components, separation membranes, bioceramics, etc., present the unique application advantages in chemical industry, environmental protection, energy, electronics, biochemistry. 

Application:

Porous chuck (adsorption working table) is a component used in the semiconductor manufacturing stage and assembled on a scribing machine or inspection device. It is a product that can use the porous structure and negative pressure of the surface of the workbench to keep the thin silicon wafer flat. The scribing machine cuts the silicon wafer with the width about 20μm, so the requirement to flatness and parallelism of the wafer adsorption surface are very high.

Ceramic vacuum chuck features

Strong permeability: uniform air permeability and water permeability, to ensure the uniform force and tightly adsorption of the silicon wafer in the grinding process without slide.

Dense and uniform structure: Adoption of micro-porous ceramic material with the dense and uniform structure, which is not easy to adsorb silicon dust, and the chuck is easy to be cleaned.

High strength: no deformation during grinding, to ensure that the silicon wafer is evenly stressed at each point when grinding, and it is not easy to occur the phenomena of edge collapse, debris.

Long life: the surface shape retention is good, the dressing cycle is long and the dressing amount is small, so it has a high life.

Easy dressing: there will be no cracking, fragmentation, threshing phenomena when dressing.

Lightweight: Due to the internal structure of pores, the specific gravity coefficient is 1.6-2.8

High insulation: insulating material, eliminate static electricity

Features

Compatibility | Customization | High-Density | High Structural Strength | Fast Delivery Time | Cost-effective

Applications

Ion-implantation | Thin Film | Etch | Process Development | Equipment Design

Design and Manufacture

12 inch Fab delivered to verify the actual performance, provide regeneration and repair, and verify the development and design。

Electrostatic chuck has the function of normal use in vacuum atmosphere, and plays the role of holding and temperature control of wafer in high vacuum plasma or special gas environment, assisting semiconductor process equipment to realize the change of electrical characteristics and physical form of specific areas of wafer, so that it presents specific functions. And through a series of other complex and demanding processes to eventually turn the wafer into a complex integrated circuit structure. Electrostatic chuck and electrostatic chuck heater are widely used in semiconductor core process, and are one of the core components of ion implantation, etching, vapor deposition of key processes.

The load transfer technology of non-contact air floating platform:

Non-contact conveying and load shifting equipment is mainly to improve the problems caused by traditional handling technology after the glass substrate becomes larger, because in the conveying and load shifting process is not directly in contact with the operation object, so it can avoid the occurrence of pollutant attachment, stress, static electricity and damage to the glass substrate. Porous material, on the other hand, significantly reduces gas flow, achieves uniform air pressure and good distribution of air cushion, and provides sufficient floating height required for operation.

Advantages of air floating system:

1、Zero friction

2、Zero wear 

3、Straight motion、Rotation motion are applicable

4、Silent and smooth operation

5、Higher damping

6、Eliminate oil

Working principle

The structure of the air floating platform is composed of nano-porous ceramics embedded in the base to form a vacuum chamber. clean compressed air with water-free and oil-free is input into the air mode gap between the bearing surface and the air floating guide rail through the gas pipe. The gas flows in the air mode gap to make the bearing surface float on the air floating guide rail. The gas acts as a lubricant to move or transport objects without friction.

The construction for common air floating hole:

a) Orifice throttling structure

b) Porous structure

The largest customized size: length 1600mm, width 1000mm

The ceramic end effector with High functional, high temperature durability, high wear resistance is used for a long time in a high temperature environment without causing damage, and the wear of the material to be moved is also reduced to a minimum, effectively controlling the diffusion of impure substances to the moved body, and the surface can also be processed according to customer requirements with special dimensions and high functional characteristics.

Ceramic end effector for chip disk drive of semiconductor equipment, precision ceramic parts have good structural strength, high temperature resistance, high pressure resistance, good precision, good parallelism, dense and uniform organization, high strength. It has been used by semiconductor production factory for many years. Fountyl has a group of excellent engineers with unique and excellent skills in ceramic alien processing projects. alien processing technology is our company's strength.

Application:

Semiconductor manufacturing: Ceramic end effector play an important role in the semiconductor manufacturing process and are often used to handle high-value materials such as silicon wafers to ensure the accuracy and stability of the process.

Machining industry: In processes requiring high precision machining, ceramic end effector can be used as tools to ensure product accuracy and surface quality.

Medical devices: Ceramic end effector are widely used in surgical robots and other medical devices, and their high accuracy and biocompatibility make them an ideal choice.

Chemical industry: Due to its excellent corrosion resistance, ceramic end effector are also widely used in the chemical industry, especially in the environment with corrosive media.

Features:

Wear resistance: Ceramic end effector have excellent wear resistance and can maintain a stable surface state for a long time.

Corrosion resistance: Ceramic end effector can work in corrosive media and maintain stable performance.

High temperature resistance: The ceramic end effector can work in a high temperature environment and is not easy to deform or melt, ensuring the stability of the process.

High precision: The ceramic end effector has excellent dimensional stability and precision, enabling high precision operation.

Lightweight: Compared to metal arms, ceramic end effector usually have a lower weight, reducing the load on the mechanical device.

Generally speaking, ceramic end effector play an important role in modern industry, and their excellent performance ensures the efficient and stable operation of automated processes.