Nanofluor elastomers can be considered as hybrid materials, bridging a gap between the low cost of fluoroelastomer (FKM) and high cost of perfluoroelastomer (FFKM) polymer types.
The range includes a fully organic ultra-low outgassing material and an inorganic filled grade with unique nano-filler to reduce erosion rates. The nano-filled material provides a chemical inertness only seen in much more costly FFKM grades, and has been developed for plasma ash or resist strip, chlorine and CxFy based etch processes.
Nanofluor grades provide some of the lowest trace metal contamination levels available from elastomer seals and ultra-low permeation rates.
Key attributes of Nanofluor:
- Ultra pure with extremely low trace metal contaminants which may cause electrical yield problems.
- Excellent plasma resistance - ideal for most plasma chemistries except high F-radical processes.
- Plasma resistance comparable or superior to many competitive pure FFKM grades
- Low coefficient of thermal expansion
- Retro-fits existing O-ring grooves (including FKM and FFKM grooves)
- Low permeation
- Low outgassing