Everlight Chemical Industrial Corporation

Taipei, 106, 
  • Booth: K2476
  • - 1st Floor

Customers Caring With Value Creation

Founded in 1972, and public listed in Taiwan Stock Exchange in 1988, Everlight Chemical focuses on the development of chemical synthesis technology, which gradually became its core competency. Today the company’s main product lines include: Color Chemicals, Light Stabilizers, Toner, Electronic Chemicals, Pharmaceutical Chemicals, and Nano-Materials. Having a total of 15 operating locations and 5 production bases around the world, it employs approximately 1,900 employees. In 2016, its revenue was NT$9.5 billion (approximately USD300M).

Everlight provides a full range of photosensitive products such as: positive resists, negative resists, BM, insulator, overcoat, high reflective layer and side protective seal ink. In additions, our products have various kinds of characteristics including excellent coating uniformity, small dark erosion, excellent surface impedance, excellent adhesion, and excellent strippability.


  • Thick Layer Photoresist
    Application: 1. Applicable to Au or Cu bump manufacture. 2. Photoresist for IC package and MEMS industry. ...

  • Features:

    1. High Sensitivity

    2. High Aspect Ratio

  • EverPI seires
    Application: 1. EverPI is positive Photosensitive Polyimide. 2. Applicable to passivation &buffer layer ...

  • Features:

    1. High Resolution

    2. Development with 2.38% TMAH

    3. Low temperature cure

    4. Stable electrical and chemical properties

    5. Good adhesion to various substrates

  • Underfill for BGA/CSP
    Application: To fill the gap between the packaged chip and the circuit board, typically used for CSP or BGA to improve connection reliability. ...

  • Features:
    1. Low Curing Temperatures
    2. Moderate Viscosity
    3. Good Adhesion
    4. Good Bonding Reliability

  • I-line Photoresist
    Application: 1. EPI 630 is positive photoresist, applicable to implant layer 2. EPI 687 is positive photoresist, applicable to passivation layer ...

  • Features for EPI 630 :

    1. High Resolution

    2. High Thermal Resistance

    3. Excellent Etching Resistance

    Features for EPI 687 :

    1. High Photo Speed

    2. Wide Process Margin

    3. Excellent Etching Resistance

  • Slurry
    Silicon Carbide Substrate Polishing Slurry...

  • Silicon Carbide Substrate Polishing Slurry - ESA 300、ESR 191
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