SVCS Process Innovation s.r.o.

Brno, 
Czech Republic
http://www.svcs.com
  • Booth: N0476
  • - 4th Floor


Front-end Semiconductor equipment from the Heart of Europe

                                                                                                                      

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Our experience is based on a long history and tradition of the semiconductor industry in former Czechoslovakia, in a place called the Czech Silicon Valley.

For over 20 years we have been striving towards development of the tomorrow’s tools and tomorrow’s process innovations. To do this successfully, we cooperate with leading R&D laboratories, universities and scientific institutes.

The company’s headquarters and production plant are located in the Czech Republic. We have world wide network of business representatives, including SVCS Service Centres in China, India, Russia and the USA.

SVCS has delivered installations for customers all over the Planet, for example: Australia, Belarus, France, China, India, Japan, Korea, Lithuania, Malaysia, Poland, Russia, Slovakia, Taiwan and the USA.

        


 Products

  • Horizontal Furnace
    Designed for High Performance in Production Environment while stays Efficient and Economic...

  • Atmospheric Processes

    Diffusion (drive-in) high temperature procesess

    Doping from solid, liquid and gaseous dopant sources e.g.: BBr3, B2H6, POCL3, PH3, BN

    Various thermal processing e.g. annealing, sintering

    Pyrogenic Wet Oxide with External Burning System

    Wet Oxide with ultra pure steamer

    Dry Oxide HiPOx (High Pressure Oxide)

    LPCVD Processes

    Silicon nitride

    Low temperature oxide (LTO)

    High temperature oxide (HTO)

    TEOS oxide Polysilicon, with tilt/flat temperature profile

    Doped polysilicon

    Oxynitride

    PECVD Processes

    Silicon nitride (incl. anti-reflective SiN solar cell coating)

    Silicon oxide

    Oxinitride

  • Vertical Furnace
    Scallable for Production or R&D Applications...

  • Atmospheric Processes

    Diffusion (drive-in) high temperature procesess
    Doping from solid, liquid and gaseous dopant sources e.g.: BBr3, B2H6, POCL3, PH3, BN
    Various thermal processing e.g. annealing, sintering
    Pyrogenic Wet Oxide with External Burning System
    Dry Oxide


    LPCVD Processes

    Silicon nitride / low stress nitride
    Low temperature oxide (LTO)
    High temperature oxide (HTO)
    TEOS oxide
    Polysilicon, with tilt/flat temperature profile
    Doped polysilicon
    Oxynitride

  • Compact Tabletop Furnace
    Unique Compact Design, All Features of the Grown-up Furnace...

  • Atmospheric Processes

    Diffusion (drive-in) high temperature procesess

    Doping from solid, liquid and gaseous dopant sources e.g.: BBr3, B2H6, POCL3, PH3, BN

    Various thermal processing e.g. annealing, sintering

    Pyrogenic Wet Oxide with External Burning System

    Wet Oxide with ultra pure steamer

    Dry Oxide HiPOx (High Pressure Oxide)

    LPCVD Processes

    Silicon nitride

    Low temperature oxide (LTO)

    High temperature oxide (HTO)

    TEOS oxide Polysilicon, with tilt/flat temperature profile

    Doped polysilicon

    Oxynitride

    PECVD Processes

    Silicon nitride (incl. anti-reflective SiN solar cell coating)

    Silicon oxide

    Oxinitride

  • NEW SVCS TOOL: ALD Single Wafer Reactor
    ALD Single Wafer Reactor for 4“ and 6“ wafers....

  • | Connection of various in-situ diagnostic tools for the fast process optimization (ellipsometer, mass spectroscopy, ...)

    | Various remote plasma sources (PE ALD)

    | Suitable for universities and scientific institutes

    | Integrated vacuum load-lock system for 4“ and 6“ wafers