ECM Semco

  • Booth: I2423
  • - 1st Floor


Your SEMI Partner with Equipment + Process Expertise

ECM SEMCO is present in the semiconductor market since 1986 and has extensive experience in engineering and manufacturing of mass-production and labortory furnaces for atmospheric and reduced-pressure processing as well as wafer transport automation and software control. 

The company's field of competence covers diffusion, oxidation, LPCVD and PECVD. Typiocal applications include LYDOP POCL3 and BCl3 Diffusion, LYTOX Wet and Dry Oxidation, Anneal, Silicon Nitride, Silicon Oxinitride, Poly Silicon and TEOS. To address the challenges attached to scaling from lab scale R&D to pilot line and volume manufacturing, SEMCO ECM proposes the MINILAB platform, an offsite  process development and qualification tool covering the complete range of above-named applications. 

SEMCO's Electrostatic Chucks offers smart solutions for clamping and processing of thin and ultra-thin wafers based on its proprietary ESC capacitive technology. SEMCO has been designing and manufacturing electrostatic chucks (ESC) and heating pedestals to the wafer processing industry since 1992. SEMCO ECM provides leading OEMs, Semiconductor Fabs, foundries and laboratories worldwide with innovative and efficient wafer handling components as original equipment or retrofit. The company actively manages global support through our subsidiaries and service centers.

ECM SEMCO also specialized in the design and manufacture of mass flow controllers, precision valves and assemblies for the control of liquids and gases used in the fabrication of semiconductor, optical and PV materials.


 Products

  • DF SERIES
    Batch Type Mass Production Furnace...

  • Up to 300mm wafers
    Diffusion,
    LPCVD and Oxidation
    Up to 4 Independent Tubes
    50 to 400 wafers per tube
    Best in-class Uniformity
    Automatic Loading
  • TUBESTAR
    R&D & Small Prod Horizontal Furnace...

  • Up to 300mm wafers
    Diffusion,
    LPCVD and Oxidation
    1 to 4 Independent Tubes
    Up to 50 wafers per tube
    Ideal for process engineering
    Tiny Footprint
    Manual or Automatic Loading
  • JETSTAR
    Ideal for Pilot & Mass Production...

  • RTA/RTP
    Up to 1200C
    High temperature infrared heating
    Si, SiC , GaN , Sapphire wafers
    Wafers up to 300mm
    Single or dual chambers
    Manual loading, Cassette to cassette automation
  • AS-Master
    Ideal for R&D & mass production...

  • RTP/RTCVD
    Up to 1450C
    Versatile 200 mm RTP system
    Atmosphere down to 10 6 Torr
    Ramp rate 0.1 C to 200 C/s (depends on furnace version)
    Manuel or cassette to cassette
  • CYBERSTAR
    Crystal Growth Equipment...

  • Models from R&D to Production
    4inch, 6inch and 8inch
    Oxides, fluorides, metals & semiconductors