Hands-on-access fabrication facility for MEMS and other microdevics is equipped with up to 6”, partly 8” wafer fabrication tools. This is the largest open facility for nano-micro fabrication in Japan. More than 280 companies have used this facility since 2010. Annual expenditure of 2020 is about 2.3M USD. The user fees cover 80 % of the expenditure.
More than 100 equipments are available for processing wide range of materials. Although open access is our strength, contract manufacturing is also welcome.
The fab is shared with other users, and sharing the costs of installation and maintenance can reduce risk in device development. Users pay a fee to the university depending on their usage time and equipment. Equipment usage fee is reasonable (it ranges from JPY 500 to 20,000 per hour), because most of the equipment is old and has been used for the production of power transistors in the same cleanroom until 2008.
Canon i-line stepper, Suss coater/developer, SPP technologies PECVD and Elionix ECR long-throw sputter have been installed and activated in 2021. Those equipments contribute precise and high-throughput processing.
We welcome your access to the fab for single process, process development or device fabrication, Contract manufacturing by our technical staff is also available.