Traditional photoresists are added with Per-and polyfluoroalkyl substances (PFAS) to enhance its coating condition and sensitivity. However, due to PFAS’s health issues to human and environment, more proposed PFAS regulations start to motivate semiconductor companies seeking for alternative chemicals.
CHIMEI’s thick film TC-Series positive photoresist is the material solution for the PFAS issue. Through our R&D’s new surface modifier design, it can offer the better coating improvement than PFAS does. Thus, TC-Series can perform the great surface uniformity without PFAS addition.